MOCVD Systems

MOCVD Systems

TurboDisc EPIK 700 GaN MOCVD System for LED Production

TurboDisc EPIK 700 GaN MOCVD System for LED Production

Combines Best-in-Class Yields and Highest Productivity to Lower LED Manufacturing Costs

Veeco’s award-winning EPIK™ 700 MOCVD system is the LED industry’s highest productivity MOCVD system that reduces cost per wafer by up to 20 percent compared to previous generations. Available in one-and two-reactor configurations, EPIK700 features breakthrough technologies, including the new IsoFlange™ center injection flow and TruHeat™ wafer coil that provide homogeneous laminar flow and uniform temperature profile across the entire wafer carrier. These technological innovations produce wavelength uniformity to drive higher yields in a tighter bin. EPIK700 offers a 2.5x throughput advantage over other systems due to its large reactor size.

Designed for mass production, EPIK 700 accommodates 31x4”, 12x6” and 6x8” wafer carrier sizes. Customers can easily transfer processes from existing TurboDisc systems to the new EPIK 700 MOCVD platform for quick-start production of high-quality LEDs. Because of the flexible EPIK 700 MOCVD platform, more upgrades, added benefits and future enhancements will continue to differentiate this world-class system.

  • Cost per wafer savings of up to 20 percent compared to previous generations
  • Best-in-class uniformity and process repeatability drive higher yield in a tighter bin
  • Industry's highest productivity reactor generates 2.5x throughput advantage compared to previous reactors
  • Maximum production with proven automation, enhanced serviceability, long campaigns between maintenance and improved footprint efficiency improvement compared to MaxBright™ MOCVD System

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