Ion Beam Deposition

Ion Beam Deposition

SPECTOR-HT Ion Beam Deposition System for Optical Coating

SPECTOR-HT Ion Beam Deposition System for Optical Coating

Ion Beam Optical Films at Physical Vapor Deposition Rates

Produce the highest quality optical thin films with improved levels of productivity and throughput with the award-winning SPECTOR-HT™ Advanced Ion Beam System. Building on the proven performance of our SPECTOR® family of ion beam systems, the SPECTOR-HT system offers excellent layer thickness control, enhanced process stability and the lowest published optical losses in the industry.

For cutting-edge optical interference coating applications ranging from bandpass filters to beam splitters to laser passives, the SPECTOR-HT has been engineered to improve key production parameters, such as target material utilization, optical endpoint control and process time. The SPECTOR-HT gives manufacturers the qualitative advantages of ion beam sputtering (IBS) technology—low scatter loss, high film purity, stable deposition rates and film thickness control of <0.1nm—in a more robust package that significantly boosts throughput and lowers cost of ownership.

  • Increase throughput up to 400 percent increase in system throughput through improved deposition rates and increased lot sizes
  • Improve materials utilization up to 300 percent increase in target materials utilization, reduces maintenance and improves overall cost of ownership
  • Enhanced thin film uniformity optimized tool geometry combines with inherent IBS process technology advantages to deliver 50 percent better material uniformity
  • Engineered for process flexibility, SPECTOR-HT improves process flexibility in multiple ways: our latest-generation process control system is operator-friendly, expanded lot sizes allows for more process choices and stable deposition rates enable unattended system operation
  • Winner of prestigious 2013 R&D 100 award

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