This source is a cost-effective solution that's ideal for high vapor pressure materials. Hot-lip heating design reduces condensation at the crucible orifice, and heat-shielding enclosure enables optimal source responsiveness and stability in the temperature operating range of 100-750°C.
The Low Temperature Single Filament Source provides stable and consistent fluxes of high vapor pressure materials. Its performance below 750°C surpasses conventional sources because of its low thermal mass. The source is enclosed in a heat-shielding package designed for optimal source responsiveness and stability in the operating range of 100-750°C. Temperature stability is critical with high vapor pressure materials, since even a small temperature variation produces a dramatic change in the flux.
This source features a modified single filament design. It achieves hot-lip heating with a filament that uniformly heats the bottom portion of the crucible but includes extra filament density at the top to compensate for radiative heat loss at the orifice. Hot-lip heating eliminates material recondensation at the crucible orifice, which can lead to source occlusion and beam shadowing.
The Low Temperature Single Filament Source offers good performance and value for general purpose applications. For demanding applications, or when large source capacities are required, a Low Temperature Dual Filament or Low Temperature SUMO Source is recommended.
Performance and Benefits The Low Temperature Single Filament Source is precisely tailored to the demands of evaporating high vapor pressure materials.
Our sales team is ready to help.