NEXUS TAMR Physical Vapor Deposition System

Enables Next-Generation Data Storage Applications

The Veeco NEXUS TAMR PVD System deposits critical low-loss films that make the optical waveguide of the laser. It features heated deposition capability of the oxide films in "dielectric" and "metal modes" of operation. These innovations enable high deposition rates and low optical loss tantalum pentoxide (Ta2O5) and aluminum oxide (Al2O3) films. The Veeco TAMR PVD System leverages Veeco's production-proven high rate reactive alumina platform and proprietary process control.

• Unsurpassed reliability and uniformity helps boost process yields
• Higher throughput and uptime for lower cost of ownership
• NEXUS platform integrates with a broad range of Veeco technologies such as ion beam deposition, ion beam etch and atomic layer deposition