NEXUS PVD-1 Physical Vapor Deposition System

Versatile, easy-to-use tool for multiple applications

Get the simplicity, reliability and performance you need with Veeco's NEXUS PVD-1 single wafer physical vapor deposition module. Compatible with a wide range of wafer sizes, the system can be tailored to multiple data storage applications such as oxide and nitride deposition, as well as magnetic materials. It also offers a high-performance, cost-effective tool for semiconductor, GaAs and packaging applications.

• Easily configured to meet specific process and production requirements
• Supports wafer sizes from 3" to 8" round
• Standard accessories include cathodes, wafer chucks, gas manifolds, shutters and pumping packages
• Modularity simplifies operator and maintenance training requirements as well as spare part stocking
• Designed for fast, simple integration with NEXUS Ion Beam Etch, Ion Beam Deposition, and other Physical Vapor Deposition tools