Veeco's high-rate alumina NEXUS PVD-HR Physical Vapor Deposition System offers superior thickness uniformity and wafer-to-wafer repeatability without target poisoning. Designed to provide arc-free and pinhole-free films, the NEXUS PVD-HR incorporates best-in-class technology with a small footprint for a lower cost of ownership.
- Highest yield with up to 4x better uniformity and repeatability than competitors
- Industry-leading throughput of 6 x 8" wafers
- System is 200mm capable, for greater process flexibility
- Superior deposition rate with tunable film properties provides lowest cost of ownership
- World-class NEXUS platform integrates with a broad range of Veeco technologies, such as ion beam deposition, ion beam etch, atomic layer deposition and reactive sputtering