Physical Vapor Deposition

Physical Vapor Deposition

NEXUS PVD-1 Physical Vapor Deposition System

NEXUS PVD-1 Physical Vapor Deposition System

Versatile, Easy-to-Use Tool for Multiple Applications

Get the simplicity, reliability and performance required with Veeco's NEXUS PVD-1 single wafer physical vapor deposition module. Compatible with a wide range of wafer sizes, the system can be tailored to multiple data storage applications, such as oxide and nitride deposition, as well as magnetic materials. It also offers a high-performance, cost-effective tool for semiconductor, GaAs and packaging applications.

  • Easily configured to meet specific process and production requirements
  • Supports wafer sizes from 3" to 8" round
  • Standard accessories include cathodes, wafer chucks, gas manifolds, shutters and pumping packages
  • Modularity simplifies operator and maintenance training requirements, as well as spare part stocking
  • Designed for fast, simple integration with NEXUS Ion Beam Etch, Ion Beam Deposition and other Physical Vapor Deposition tools

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