Ion Beam Etch

Ion Beam Etch

NEXUS IBE-420Si Ion Beam Etch System

NEXUS IBE-420Si Ion Beam Etch System

Unsurpassed Uniformity over Multiple Energy and Process Angles

Maximize slider yields and achieve excellent ion beam etch uniformity with the NEXUS® IBE-420Si™ Ion Beam Etching System. The NEXUS IBE-420Si System offers unsurpassed uniformity over a wide range of energy and process angles, making it ideal for etch depth control of next-generation ABS step and cavity processing.

  • Superior uniformity and improved etch depth control
  • Highest throughput and reduced footprint for lowest cost of ownership
  • Easily integrates with common technologies on world-class NEXUS hardware and software platform
  • New NEXUS 420 Ion Source improves etch uniformity and process repeatability
  • Also available with RF350 source for operations that have process-qualified use of RF350 source
  • Platform can be cost-effectively field-upgraded to NEXUS 420 Ion Source

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