Ion Beam Etch

Ion Beam Etch

NEXUS IBE-350Si Ion Beam Etch System

NEXUS IBE-350Si Ion Beam Etch System

Cost-Effective Upgrade to Next-Generation Etch Platform

Get improved process control, reduced footprint and a field-upgradable design with Veeco's NEXUS IBE-350Si Ion Beam Etching System. This improved system utilizes the same ion source, grids, fixtures and source-to-substrate geometry as legacy RF350S tools on a more reliable platform.

  • Process performance matches legacy RF-350S tools, with enhanced reliability
  • Ideal for cavity and shallow etching for higher device yield
  • Utilizes RF350 Ion Source and Staycool TECfixture to reduce substrate temperature
  • Field upgradeable to the NEXUS-420 Ion Source

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