Ion Beam Deposition

Ion Beam Deposition

NEXUS IBD-LDD Ion Beam Deposition System

NEXUS IBD-LDD Ion Beam Deposition System

World-Class Low Defect Level Deposition

Photomask manufacturing demands the highest levels of particle control while depositing sophisticated multiple-layer film structures. This challenge is met with Veeco’s Nexus IBD-LDD Ion Beam Deposition System. Veeco has successfully served the photomask market since the 1990s, and the years of learning have resulted in today’s state-of-the-art system. The IBD-LDD system is ideal for multilayer deposition on EUV mask blanks, and other mask applications requiring low defect levels and advanced thin films.

  • Production-proven design
  • Lowest defect density
  • Excellent uniformity and repeatability
  • Deposit multiple materials in same chamber
  • Can be integrated into other process modules into a cluster tool

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