Select the Chemical Vapor Deposition that's right for you.
NEXUS CVD System
NEXUS CVD System
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Conformal metal deposition process to enable next generation TFMHsEnables thin film magnetic head areal densities greater than 400gb/in² |
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In response to the market's need for a conformal metal deposition process to enable a new generation of TFMHs, Veeco successfully developed the NEXUS CVD Chemical Vapor Deposition System. The NEXUS CVD is a great example of Veeco's alignment with data storage manufacturers' technology roadmaps. As part of the NEXUS family, this system can be integrated on a common hardware and software platform with complementary Veeco technologies, such as ion beam etch, ion beam deposition and physical vapor deposition. |
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