Chemical Vapor Deposition

Chemical Vapor Deposition

NEXUS CVD Chemical Vapor Deposition System

NEXUS CVD Chemical Vapor Deposition System

Conformal Metal Deposition Process to Enable Next-Generation TFMHs

In response to the market's need for a conformal metal deposition process to enable a new generation of TFMHs, Veeco successfully developed the NEXUS CVD Chemical Vapor Deposition System. The NEXUS CVD is a great example of Veeco's alignment with data storage manufacturers' technology roadmaps. As part of the NEXUS family, this system can be integrated on a common hardware and software platform with complementary Veeco technologies, such as ion beam etch, ion beam deposition and physical vapor deposition.

  • Conformal metal deposition process supports next-generation thin film magnetic heads
  • Enables areal densities greater than 400 Gb/in²
  • Integrates easily on NEXUS hardware and software platform

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