Select the MBE System that's right for you.
GEN10 MBE System
GEN200 Edge MBE System
GEN20 MBE System
GEN2000 Edge MBE System
GEN930 MBE System
GEN II MBE System
MBE Systems Features and Benefits
Features
- Automated architecture
- Application flexibility
- Economical upgrade path
- Built on nine years of reliable cluster tool technology
Benefits
- Automated wafer transfer enables high system utilization, allowing multiple researchers to use the system at the same time and perform unattended growths and calibrations
- Economical upgrade path to additional growth modules, maximum of three
- Configurable, material specific growth modules in a cluster architecture enable growth of incompatible materials in one vacuum system
- Direct process path to larger production MBE systems
Features:
- Automated, modular architecture
- Design allows for up to two growth modules
- Optional bulkhead installation, to separate load lock modules from cluster tool and growth modules
Benefits:
- Proven lowest cost multi-4" system in industry
- Significantly smaller footprint than comparable MBE tools
- High throughput
- Allows for processing of incompatible materials
- Easier maintenance
- Reliable design
Features
- Vertical source substrate geometry for optimum material capacity of sources
- Configurable cryopanel, manipulator, shutters, and in-situ monitoring equipment
- 12 MBE source ports with option to include e-beam capabilities
- Multiple, large, direct-coupled pumping ports
- Economical upgrade path to additional growth modules, maximum of two
- Manual or automatic transfer
Benefits
- Maximum uptime
- Better control and greater purity of growth environment
- Enables advanced research on wide variety of challenging materials
- Efficient research and process development at a low cost of ownership
- Option to add automated cluster tool in the future
Features:
- Automated, modular architecture
- Design allows for up to two growth modules
- Optional bulkhead installation, to separate load lock modules from cluster tool and growth modules
Benefits:
- Proven industry's lowest cost per wafer processing
- 40%-60% smaller footprint than comparable MBE systems
- Greatly increased throughput
- Allows for processing of incompatible materials
- Easy maintenance
- Optimizes cleanroom space
- Reliable design
Features
- Up to 1x3" wafer processing
- Modular design
- Integrates wide range of in-situ monitoring techniques
- 11 source ports on tilted vertical geometry
- Incorporates technology of Veeco GEN II MBE system, which holds GaAs and AlGaAs performance records
Benefits
- Maximum flexibility in choosing arrangement of source materials
- Maximum choice of monitoring techniques
- Expandable system capabilities as needed
- Based on production-proven technology
Features:
- Radial-vane source cryopanel complements standard growth chamber cryopanel
- Pneumatically actuated source shutters
- Easily accommodates various analyical techniques
- Precise substrate rotation with accurate beam equivalent pressure measurement
Benefits:
- Cost-effective and efficient system ideal for research and product development
- Well suited to high-quality, high-purity optoelectronic materials applications
- Superior facility and application flexibility
- Record-setting track record with more than 220 systems in operation worldwide