High Temperature Source

For superior high-temperature operation, more stable beam flux

Excellent molecular beam epitaxy (MBE) system source operation, for low-vapor pressure materials at temperatures up to 2000° C, is available through Veeco's High Temperature Source. This source uses only refractory metals in the hot zone of the cell, with insulating ceramics like PBN in cooler regions to prevent outgassing during operation. It offers fully replaceable tungsten filaments and heat shielding, a variety of crucible materials, and is regulated by temperature controller for more stable beam flux than electron beam evaporators.

• Excellent high temperature operation for low-pressure materials at temperatures up to 2000º C
• Use of refractory metals in hot zone, PBN ceramics in cooler regions, prevents outgassing
• Fully replaceable tungsten filaments and heat shielding at the orifice -- reduces user costs, increases uptime
• Provides extremely stable beam flux for low-vapor pressure materials
• Wide range of crucibles available