MBE Source Flanges

For deposition processes in UHV reactors

You obtain the ability to add molecular beam epitaxy (MBE)-type deposition capabilities to ultra-high vacuum (UHV) reactors with Veeco Source Flanges. The flanges are compatible with many MBE sources and application, and are available in a wide variety of source flange styles, including the most common in use today. A wide variety of options is available for added flexibility.

• Allows users to add high-quality MBE-type deposition capabilities to UHV reactors
• Flanges are compatible with many MBE sources and can help grow many types of epitaxial films -- applicable to many laboratory or production needs
• Available in many different source flange styles, including the most common ("source-to-substrate" distances ~4"-10"/102mm-254mm)
• Wide range of product options available -- users can choose desired outside diameter of main flange, number of cell ports, and source-to-substrate distance