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Select the MOCVD System that's right for you.
  • TurboDisc MaxBright MHP GaN MOCVD Multi-Reactor System
  • TurboDisc MaxBright M GaN MOCVD Multi-Reactor System
  • TurboDisc K475 As/P MOCVD System
  • TurboDisc K465i HP GaN MOCVD System
  • TurboDisc K465i GaN MOCVD System
  • TurboDisc K465 GaN MOCVD System
  • TurboDisc E475 As/P MOCVD System

TurboDisc E475 As/P MOCVD System

Enabling highest volume production of premium devices

Get the industry's leading throughput for high-volume production of HB-LEDs, laser diodes, pHEMTs, HBTs, and III-V concentrator solar cells, with the Veeco TurboDisc® E475 As/P. This superb metal organic chemical vapor deposition (MOCVD) system delivers increased capacity and improved cost of ownership over previous systems. The E475 system also improves product quality, productivity and yield.

  • Industry's leading throughput is now available for mass production of HB-LEDs, concentrator solar cells, laser diodes, pHEMTs, and HBTs
  • Sophisticated vacuum load-lock automation for long production cycles and highest productivity
  • Integrated RealTemp® 200 technology provides direct, automated closed-loop wafer temperature control -- assures process reproduceability
  • FlowFlange® offers discrete injection zones with individual flow matching, for excellent uniformity and repeatability
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