Select the MOCVD System that's right for you.
TurboDisc MaxBright MHP GaN MOCVD Multi-Reactor System- TurboDisc MaxBright M GaN MOCVD Multi-Reactor System
TurboDisc K475 As/P MOCVD System.jpg)
TurboDisc K465i HP GaN MOCVD System
TurboDisc K465i GaN MOCVD System
TurboDisc K465 GaN MOCVD System
TurboDisc E475 As/P MOCVD System
MOCVD Systems Features and Benefits
Features:
- Uniform FlowFlange® technology results in superior uniformity and repeatability
- Compact cluster architecture
- Highest capacity configurations
- Highest throughput reactors
- Low maintenance TurboDisc technology enables highest system availability
Benefits:
- Highest throughput
- Highest footprint efficiency
- Low cost of ownership
- Single or multi-chamber layer growth
- Seamless process transfer from K465i
- Upgradable with advanced technologies
Features:
- Uniform FlowFlange® technology results in superior uniformity and repeatability
- Compact cluster architecture
- Highest capacity configurations
- Highest throughput reactors
- Low maintenance TurboDisc technology enables highest system availability
Benefits:
- Highest throughput
- Highest footprint efficiency
- Low cost of ownership
- Seamless process transfer from K465i
- Upgradable to the high-performance MaxBright MHP™
Features:
- Modular design
- Tunable FlowFlange®
- Advanced RealTemp® 200 temperature control
- Comprehensive wafer carrier solutions
- TurboDisc® high velocity laminar flow
- Integrated vacuum loadlock
Benefits:
- Industry leading throughput
- Excellent uniformity and repeatability
- Superior reproducibility
- Options to fit particular needs
- Low maintenance with highest productivity
- Minimal downtime between runs
Features:
- Uniform FlowFlange® technology results in superior uniformity and repeatability
- Low maintenance TurboDisc technology enables highest system availability
Benefits:
- Production-proven GaN MOCVD System
- Industry's highest productivity due to full automation and one-run recovery period after maintenance
Features:
- Uniform FlowFlange® technology results in superior uniformity and repeatability
- Low maintenance TurboDisc technology enables highest system availability
Benefits:
- Production-proven GaN MOCVD System
- Industry's highest productivity due to full automation and one-run recovery period after maintenance
Features:
- Shares its platform with the proven Veeco K300 MOCVD system -- designed for superior throughput
- Advanced TurboDisc® reactor technology, high velocity laminar flow, and clean operation eliminates the need for in-situ bakes
Benefits:
- Delivers the industry's highest throughput for high-volume production of GaN-based blue and green LEDs and blue lasers
- Automated platform produces more profit for HB-LED manufacturers while controlling capital cost
- Excellent production yields, uniformity, and repeatability
Features:
- Industry's leading throughput for high-volume production of multi-junction III-V concentrator solar cells, HB-LEDs, laser diodes, pHEMTs and HBTs
- Low-maintenance TurboDisc® technology enables highest uptime
- Integrated RealTemp® 200 technology provides direct wafer temperature control, fast gas switching and strict control of interface abruptness
Benefits:
- Ideal for mass production of HB-LED and concentrator solar cells
- Superior material quality and process efficiency plus high productivity
- High return on investment for HB-LEDs and III-V concentrator solar cells
