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Select the MOCVD System that's right for you.
  • TurboDisc MaxBright MHP GaN MOCVD Multi-Reactor System
  • TurboDisc MaxBright M GaN MOCVD Multi-Reactor System
  • TurboDisc K475 As/P MOCVD System
  • TurboDisc K465i HP GaN MOCVD System
  • TurboDisc K465i GaN MOCVD System
  • TurboDisc K465 GaN MOCVD System
  • TurboDisc E475 As/P MOCVD System

MOCVD Systems Features and Benefits

Features:

  • Uniform FlowFlange® technology results in superior uniformity and repeatability
  • Compact cluster architecture
  • Highest capacity configurations
  • Highest throughput reactors
  • Low maintenance TurboDisc technology enables highest system availability

Benefits:

  • Highest throughput
  • Highest footprint efficiency
  • Low cost of ownership
  • Single or multi-chamber layer growth
  • Seamless process transfer from K465i
  • Upgradable with advanced technologies
 

Features:

  • Uniform FlowFlange® technology results in superior uniformity and repeatability
  • Compact cluster architecture
  • Highest capacity configurations
  • Highest throughput reactors
  • Low maintenance TurboDisc technology enables highest system availability

Benefits:

  • Highest throughput
  • Highest footprint efficiency
  • Low cost of ownership
  • Seamless process transfer from K465i
  • Upgradable to the high-performance MaxBright MHP™
 

Features:

  • Modular design
  • Tunable FlowFlange®
  • Advanced RealTemp® 200 temperature control
  • Comprehensive wafer carrier solutions
  • TurboDisc® high velocity laminar flow
  • Integrated vacuum loadlock

Benefits:

  • Industry leading throughput
  • Excellent uniformity and repeatability
  • Superior reproducibility
  • Options to fit particular needs
  • Low maintenance with highest productivity
  • Minimal downtime between runs
 

Features:

  • Uniform FlowFlange® technology results in superior uniformity and repeatability
  • Low maintenance TurboDisc technology enables highest system availability

Benefits:

  • Production-proven GaN MOCVD System
  • Industry's highest productivity due to full automation and one-run recovery period after maintenance
 

Features:

  • Uniform FlowFlange® gas distribution system technology results in superior uniformity and repeatability
  • Low maintenance TurboDisc high velocity laminar flow technology enables highest system availability

Benefits:

  • Production-proven GaN MOCVD System
  • Industry's highest productivity due to full automation and one-run recovery period after maintenance
 

  Features:

  • Shares its platform with the proven Veeco K300 MOCVD system -- designed for superior throughput
  • Advanced TurboDisc® reactor technology, high velocity laminar flow, and clean operation eliminates the need for in-situ bakes

  Benefits:

  • Delivers the industry's highest throughput for high-volume production of GaN-based blue and green LEDs and blue lasers
  • Automated platform produces more profit for HB-LED manufacturers while controlling capital cost
  • Excellent production yields, uniformity, and repeatability
 

  Features:

  • Industry's leading throughput for high-volume production of multi-junction III-V concentrator solar cells, HB-LEDs, laser diodes, pHEMTs and HBTs
  • Low-maintenance TurboDisc® technology enables highest uptime
  • Integrated RealTemp® 200 technology provides direct wafer temperature control, fast gas switching and strict control of interface abruptness

  Benefits:

  • Ideal for mass production of HB-LED and concentrator solar cells
  • Superior material quality and process efficiency plus high productivity
  • High return on investment for HB-LEDs and III-V concentrator solar cells
 
 
 
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