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Select the Ion Beam Etch that's right for you.
  • NEXUS IBE-350Si Ion Beam Etching System
  • NEXUS IBE-420i Ion Beam Etching System
  • NEXUS IBE-420Si Ion Beam Etching System
  • NEXUS IBE-350Se Ion Beam Etching System

NEXUS IBE-420Si Ion Beam Etching System

 

Unsurpassed uniformity over multiple energy and process angles

Maximize slider yields and achieve excellent ion beam etch uniformity with the NEXUS® IBE-420Si™ Ion Beam Etching System. The NEXUS IBE-420Si System offers unsurpassed uniformity over a wide range of energy and process angles, making it ideal for etch depth control of next-generation ABS step and cavity processing.

  • Superior uniformity and improved etch depth control
  • Highest throughput and reduced footprint for lowest cost of ownership
  • Easily integrates with common technologies on world-class NEXUS hardware and software platform
  • New NEXUS 420 Ion Source improves etch uniformity and process repeatability
  • Also available with RF350 source for operations that have process-qualified use of RF350 source
  • Platform can be cost-effectively field-upgraded to NEXUS 420 Ion Source

 
More Information
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Download Reactive Ion Beam Etching of InP
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36.3 MB MOV Watch Ion Beam Etch Animation [36.3 MB MOV]
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