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Select the Ion Beam Etch that's right for you.
  • NEXUS IBE-350Si Ion Beam Etching System
  • NEXUS IBE-420i Ion Beam Etching System
  • NEXUS IBE-420Si Ion Beam Etching System
  • NEXUS IBE-350Se Ion Beam Etching System

NEXUS IBE-420i Ion Beam Etching System

Higher device yields through improved CD Sigma control

Raise data storage device yields and achieve exceptional uniformity with the NEXUS® IBE-420i™ Ion Beam Etching System. It offers improved CD sigma control for data storage applications, faster time to market for new applications, faster install time, and better asset utilization and cost of ownership.

  • Designed to meet tigher etch depth control requirements
  • NEXUS ion source provides exceptional WIW rotated and 3D etch uniformity
  • Easily integrates with common technologies on world-class NEXUS hardware and software platform
  • Combined with an enhanced control system, NEXUS ion source offers excellent WTW and RTR repeatability
  • Available in single or dual cluster configurations
  • Backward-compatible to existing Veeco device-net cluster front ends
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