Select the Ion Beam Etch that's right for you.
NEXUS IBE-350Si Ion Beam Etching System
NEXUS IBE-420i Ion Beam Etching System
NEXUS IBE-420Si Ion Beam Etching System
NEXUS IBE-350Se Ion Beam Etching System
Ion Beam Etch Systems Features and Benefits
Features:
- Ideal for cavity and shallow etching for higher device yield
- Utilizes RF350 Ion Source and Staycool TECfixture to reduce substrate temperature
- Based on Veeco's cutting-edge NEXUS ion beam etch platform.
Benefits:
- Improved process control and smaller system footprint
- Delivers process performance that matches legacy tool productivity
- Ion source is field upgradeable, reducing tool downtime and helping control costs
Features:
- Designed to meet tighter etch depth control requirements
- NEXUS ion source provides exceptional WIW rotated and 3D etch uniformity
- Easily integrates with common technologies on NEXUS ion beam etch platform
Benefits:
- Provides lower cost of ownership toolset
- Faster time to market for new applications
- Better asset utilization and faster install time
Features:
- Designed for improved etch depth control of next-generation ABS step and cavity processing
- New NEXUS 420 Ion Source improves etch uniformity and process repeatability
- Easily integrates with common technologies on NEXUS ion beam etch platform
Benefits:
- Superior uniformity and improved etch depth control for higher device yield
- Highest throughput and reduced footprint for lowest cost of ownership
- Faster time to market for new applications
- Better asset utilization and faster install time
Features:
- High power operation with enhanced substrate cooling
- High throughput and reduced footprint
- Ability to cluster on common NEXUS platform
Benefits:
- Improves productivity of ABS deep cavity processing
- Excellent tool for high etch rate applications
- Lower cost of ownership and improved system utilization rate