Select the Chemical Vapor Deposition that's right for you.
NEXUS CVD System
Chemical Vapor Deposition Systems Features and Benefits
Conformal metal deposition process to enable next generation TFMHs
In response to the market's need for a conformal metal deposition process to enable a new generation of TFMHs, Veeco successfully developed the NEXUS CVD Chemical Vapor Deposition System. The NEXUS CVD is a great example of Veeco's alignment with data storage manufacturers' technology roadmaps. As part of the NEXUS family, this system can be integrated on a common hardware and software platform with complementary Veeco technologis, such as ion beam etch, ion beam deposition and physical vapor deposition.
Benefits:
- Conform metal deposition process supports next generation thin film magnetic heads
- Enables areal densities greater than 400 Gb/in²
- Integrates easily on NEXUS hardware and software platform