The Veeco Multi-Orifice CBr4 Gas Flow Control System, when used with the Veeco Low Temperature Gas Source, allows for control of the introduction of CBr4 gas into a UHV environment, utilizing CBr4 gas as a carbon dopant source. Using closed-loop pressure control and a series of pneumatically operated on-off valves, the system maximizes the ability to regulate the gas. The incorporation of interlocks prevents potential equipment damage and ensures optimal vacuum system performance.
The system also includes the option for an independent plumbing system to introduce H2 gas into a Veeco Atomic Hydrogen Source, converting the gas to atomic hydrogen. This method lowers the oxide desorption temperature during the substrate cleaning process and serves as a surfactant during the film growth process to enhance atomic surface mobility.
The Veeco CBr4 Gas Flow Control System provides for two modes for selection system states: local and remote. Remote state on automated MBE systems requires version ECS1™ Molly® Growth Control Software controlling system growth.
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