Process Equipment
Ion Sources - Systems

Veeco is the world leader in ion beam technology, offering the most comprehensive ion source product line available. With technologies including: DC, RF, Anode Layer, End-Hall and Cylindrical Magnetron.
Veeco's technology advantage in ion beam grid optics has produced some of the world's most collimated and uniform ion beams for etch and alignment applications. In addition, Veeco has produced highly divergent ion sources for large area ion assisted deposition applications. Please contact one of our product specialists to help you select the best solution for your application.
Gridded DC Ion Sources
Veeco’s DC ion sources come in either circular or linear geometries and are easy to install, clean and maintain.
Gridded RF Ion Sources
Veeco’s filamentless RF ion sources are low maintenance and ideal for processes using 100% argon, oxygen or other reactive gases.
Gridless Anode Layer Ion Sources
Veeco’s high power anode layer ion sources are scalable in either circular or linear geometries in excess of three meters and feature high current density operation from high vacuum up to milliTorr pressure ranges.
Gridless End-Hall Ion Sources
Using intense magnetic fields and substantial electron currents, Veeco’s low maintenance, gridless ion sources produce a very high current density at lower energies than is practical with gridded sources.
Magnetrons
Veeco brings its vast ion beam experience to our Isoflux Cylindrical Magnetrons (ICM). These sputtering sources use cylindrical targets to surround the substrate with coating materials.