Epitaxial Equipment : MOCVD Systems

Engineered specifically for the high volume production of long wavelength, infrared and visible lasers, VCSELs, and InP-based electronic materials, the E300LDM provides a level of process control and reliability formerly unavailable for large-scale MOCVD production tools. Along with next generation growth chamber and Flow Flange designs, the E300LDM features exclusive RealTemp optical control technology, which provides in-situ monitoring and control of wafer temperature during production runs. When combined with standard components, including a glove box system for extremely clean wafer transfer and an acoustic measurement system for precise mass flow control of process gases, these advancements in deposition technology result in exceptional material quality and process efficiency. In order to facilitate the high volume production of sensitive materials while ensuring the amount of resources needed for deposition remains at a cost-effective level, our engineers designed the E300LDM growth chamber to improve flow conditions and efficiently utilize reactants. As with all of our MOCVD tools, the E300LDM features the exclusive TurboDisc technology platform, which utilizes a vertical growth chamber configuration to accomplish exceptional thickness, doping and composition uniformity.