Epitaxial Equipment : MOCVD Systems

Fully configured for InGaAsP, InGaAlP, and AlGaAs laser diode production, the D180LDM provides exceptional uniformity of thickness, doping, and composition within grown epitaxial layers. Featuring the exclusive RealTemp optical control system, which provides in-situ monitoring and control of wafer temperature during production runs, the D180LDM provides customers with unprecedented control of sensitive material processes. Like all TurboDisc MOCVD tools, the D180LDM utilizes the exclusive vertical rotating disc reactor technology to achieve superior results. The vertical configuration of the growth chamber enhances particulate control by eliminating unwanted deposits above the wafers, while a unique Flow Flange design allows for precise control of uniformity, layer thickness, and sharp interface abruptness.