Epitaxial Equipment : MOCVD Systems

Designed for high efficiency and superior material quality, the D180 GaN is an advanced MOCVD tool for the production of GaN-based materials. Drawing from extensive experience in the manufacture of MOCVD tools, TurboDisc engineers have developed unique configurations for the D180 GaN growth chamber and integrated Flow Flange, which allows for precise process control and excellent run repeatability. Each D180 GaN system provides maximum yield while maintaining exceptional uniformity of thickness, doping, and composition in grown epitaxial layers. The reactor has been designed for excellent quality AlGaN deposition at fast growth rates.