Metrology & Instrumentation
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Epitaxial Equipment
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Epitaxial Equipment

MOCVD - Systems

D180 GaN MOCVD System  
D180 GaN MOCVD System   
MOCVD for the production of GaN-based materials, providing maximum yield while maintaining exceptional uniformity of thickness, doping, and composition.
 
D180 LDM MOCVD System  
D180 LDM MOCVD System   
MOCVD system configured for InGaAsP, InGaAlP, and AlGaAs laser diode production, with exceptional uniformity of thickness, doping, and composition.
 
E300 LDM MOCVD System  
E300 LDM MOCVD System   
MOCVD system for the high volume production of long wavelength, infrared and visible lasers, VCSELs, and InP-based electronic materials.
 
E450  As/P MOCVD System  
E450 As/P MOCVD System   
MOCVD system for the high volume production of epitaxial materials such as As/P.
 
Pioneer P125 MOCVD System  
Pioneer P125 MOCVD System   
MOCVD research system capable of depositing a range of semiconductor materials, metals, and oxides.
 
TurboDisc E475 As/P MOCVD System  
TurboDisc E475 As/P MOCVD System   
The new TurboDisc® E475 As/P Metal Organic Chemical Vapor Deposition (MOCVD) system with industry's leading throughput is now available for mass production of HB-LED and Concentrator Solar cells.
 
TurboDisc K300 GaN MOCVD System  
TurboDisc K300 GaN MOCVD System   
The new TurboDisc K300 GaN MOCVD System is the only fully automated, "future-proof" MOCVD platform available on the market today for the production of GaN-based materials for production of blue and green LEDs and blue lasers.
 
TurboDisc K465 GaN MOCVD System  
TurboDisc K465 GaN MOCVD System   
Sharing its platform with the K300, The new TurboDisc K465 GaN MOCVD System delivers the industry's highest throughput available today for high volume production of GaN-based blue and green LEDs and blue lasers.