Ideal for uniform processing of large-scale substrates, Veeco's 6 x 66cm RF linear ion source provides low-maintenance, filamentless operation on 100 percent argon, oxygen and other reactive gases for long uninterrupted production runs.
- Provides the proper current densities and uniformities for pre-clean, etch and ion beam assisted deposition (IBAD) applications
- Reliable, uniform operation in both inert and oxidizing environments
- Low-to-high power operation
- Industry's only filamentless RF Neutralizer enables longer production runs
- Optional four-grid design offers very high collimation
- Stable and efficient plasma operation allows precise control and high repeatability