Veeco announces the 16cm RF High Power (HP) ion source, with beam uniformity of <10% across 120cm. It is ideal for use in reactive processes such as ion assisted e-beam (IAD) or sputter deposition processes.
- Supports wide range of high power peration: 200 to 1500eV and 200 to >1000mA
- Reliable, uniform operation in both inert and oxidizing environments
- Increased power and current uniformity facilitates improved packing densities and increased oxidation rates
- Also enhances stoichiometry control and helps create smoother films
- Wide variety of grid sets available - Multiple interface packages facilitate easy upgrade path for existing IAD systems
- For sputter deposition, offers substantial deposition rate increases
- Ensures high thin film quality and stable process operation