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World-class process equipment solutions
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Veeco creates world-class process equipment solutions for manufacturers using thin film etch and deposition technology to create components such as:
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NEXUS DLC Deposition Systems provide protective coatings that meet the slider overcoat and landing pad demands of next generation thin film magnetic heads.
Create ultra-precise, high purity thin film layer devices with maximum uniformity and repeatability with NEXUS® Ion Beam Deposition (IBD) Systems.
Etch precise, complex features for high-yield production of discrete microelectronic devices and components with the NEXUS Ion Beam Etch (IBE) Systems.
Veeco offers the most comprehensive array of ion beam sources for a broad range of applications, including Gridded DC and Gridded RF sources, Gridless Anode and Gridless End Hall sources, as well as Isoflux Cylindrical Magnetrons.
Ensure high-yield fabrication of thin film-based devices for next generation products with Veeco's NEXUS Physical Vapor Deposition (PVD) Systems.
Process TFMH wafers, LED devices and solar cells with greater precision and higher throughput with Veeco's Optium® line of lapping and dicing systems.
Veeco is advancing the introduction of thin film CIGS solar cells with our PV-Series™ sources: the world's only production-scale thermal deposition sources for high-efficiency, highly uniform CIGS thin film manufacturing.
Veeco integrates sputtering, reactive sputtering and thermal evaporation technologies on their FastLine™ and FastFlex™ Coating Systems for glass and flexible thin film substrates.
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Process Equipment Application Support Partnering with leading data storage and solar cell manufacturers around the globe, Veeco continually introduces next generation technology to improve productivity, system reliability and nanoscale device uniformity. |