Process Equipment : Physical Vapor Deposition

NEXUS PVD-1 Physical Vapor Deposition System

Versatile, easy-to-use tool for multiple applications

Get the simplicity, reliability and performance you need with Veeco's NEXUS PVD-1 single wafer physical vapor deposition module. Compatible with a wide range of wafer sizes, the system can be tailored to multiple data storage applications such as oxide and nitride deposition, as well as magnetic materials. It also offers a high-performance, cost-effective tool for semiconductor, GaAs and packaging applications.

Description

NEXUS PVD-1 Physical Vapor Deposition System		More Information

Easily configured to meet specific process and production requirements Supports wafer sizes from 3" to 8" round Standard accessories include cathodes, wafer chucks, gas manifolds, shutters and pumping packages Modularity simplifies operator and maintenance training requirements as well as spare part stocking Designed for fast, simple integration with NEXUS Ion Beam Etch, Ion Beam Deposition, and other Physical Vapor Deposition tools		Contact Veeco for detailed specifications