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Process Equipment : Ion Beam Etch

NEXUS IBE-350Si Ion Beam Etching System New product

NEXUS IBE-350Si Ion Beam Etching System
Cost-effective upgrade to next-generation etch platform

Get improved process control, reduced footprint and a field-upgradable design with Veeco's NEXUS IBE-350Si Ion Beam Etching System. This improved system utilizes the same ion source, grids, fixtures and source-to-substrate geometry as legacy RF350S tools on a more reliable platform. 

NEXUS IBE-350Si Ion Beam Etching System
   More Information
 
  • Process performance matches legacy RF-350S tools, with enhanced reliability
  • Ideal for cavity and shallow etching for higher device yield
  • Utilizes RF350 Ion Source and Staycool TECfixture to reduce substrate temperature
  • Field upgradeable to the NEXUS-420 Ion Source
   Contact Veeco for detailed specifications