NEXUS IBE-350Se Ion Beam Etching System
Higher throughput of ABS deep cavity processing
Maximize the productivity of ABS deep cavity processing and high etch rate applications with Veeco's NEXUS IBE-350Se Ion Beam Etching System. Key attributes include lower cost of ownership, high throughput, small footprint, improved system utilization and the ability to cluster on the NEXUS platform.
- Description
- Application
Notes
NEXUS IBE-350Se Ion Beam Etching System
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- High power operation with enhanced substrate cooling
- High throughput and reduced footprint for lowest cost of ownership
- Ability to cluster on common NEXUS platform
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Contact Veeco for detailed specifications
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- Cost-Effective Thin-Film Bulk Acoustic Resonator (FBAR) Production
- Advanced Sensor Fabrication Using Integrated Ion Beam Etch and Ion Beam Deposition Processes
- Applications of Reactive Ion Beam Etching to Thin Film Magnetic Head Track-Width Trimming
- Reactive Ion Beam Etching of InP