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Atomic Force Microscopy Symposium at PittCon 2001
Atomic Force Microscopy Symposium at PittCon 2001
Jan 11, 2001
Atomic Force Microscopy Symposium at PittCon 2001
Jan 11, 2001
Santa Barbara, CA, January 11, 2001 - Following highly successful sessions in '98, '99, and '00, the first-ever technical sessions on Atomic Force Microscopy (AFM) at the Pittsburgh Conference (PittCon), a fourth symposium will be held at PittCon 2001 in New Orleans on Monday afternoon, March 5th at 1:30PM.
The PittCon 2001 symposium, chaired by Monte Heaton of AFM leader Digital Instruments/Veeco Metrology (Santa Barbara, CA), focuses on a variety of applications of AFM, including biology, materials science, and polymers. A special talk will be given explaining the advantages and complementary capabilities of AFM relative to other microscopies (SEM, TEM) and analytical techniques. Speakers include academic and industry standouts Dr. Philip Russell (North Carolina State University), Dr. Jan H. Hoh (John Hopkins School of Medicine), Dr. Vivian Jones (3M Pharmaceuticals), Dr. Donald A. Chernoff (Advanced Surface Microcopy, Inc.), and Dr. Sergei Magonov (Digital Instruments/Veeco Metrology).
The program is recommended for anyone interested in, or performing, ultra-high resolution surface studies such as morphology (2-3nm lateral resolution, sub-angstrom vertical resolution), monitoring of morphological and nanostructural changes during processing of materials, surface forces, and 3D compositional mapping of component concentrations, orientations, and distributions. Unlike other techniques, such as TEM, AFM requires no staining, vacuum or tedious sample prep. AFM comprises a variety of techniques which use a tiny, sharp probe to sense sample characteristics to provide nanometer to atomic-scale topographical maps, and also includes techniques that sense compositional variations, surface elasticity, binding forces, magnetic forces and more.
For those who cannot attend the Symposium, portions will be webcast on www.webcasting.com/pittcon.com, Tuesday, March 6th, 1:30pm (CST). Please access www.webcasting.com/pittcon.com for webcast registration information.
Veeco Instruments Inc., headquartered in Plainview, New York is a worldwide leader in metrology tools for the data storage, semiconductor and research and scientific markets; and process equipment etch and deposition tools for the data storage and opto-telecommunications markets. Manufacturing and engineering facilities are located in New York, California, Colorado, Virginia, and Arizona. Global sales and service offices are located throughout the United States, Europe, Japan and Asia Pacific.
The PittCon 2001 symposium, chaired by Monte Heaton of AFM leader Digital Instruments/Veeco Metrology (Santa Barbara, CA), focuses on a variety of applications of AFM, including biology, materials science, and polymers. A special talk will be given explaining the advantages and complementary capabilities of AFM relative to other microscopies (SEM, TEM) and analytical techniques. Speakers include academic and industry standouts Dr. Philip Russell (North Carolina State University), Dr. Jan H. Hoh (John Hopkins School of Medicine), Dr. Vivian Jones (3M Pharmaceuticals), Dr. Donald A. Chernoff (Advanced Surface Microcopy, Inc.), and Dr. Sergei Magonov (Digital Instruments/Veeco Metrology).
The program is recommended for anyone interested in, or performing, ultra-high resolution surface studies such as morphology (2-3nm lateral resolution, sub-angstrom vertical resolution), monitoring of morphological and nanostructural changes during processing of materials, surface forces, and 3D compositional mapping of component concentrations, orientations, and distributions. Unlike other techniques, such as TEM, AFM requires no staining, vacuum or tedious sample prep. AFM comprises a variety of techniques which use a tiny, sharp probe to sense sample characteristics to provide nanometer to atomic-scale topographical maps, and also includes techniques that sense compositional variations, surface elasticity, binding forces, magnetic forces and more.
For those who cannot attend the Symposium, portions will be webcast on www.webcasting.com/pittcon.com, Tuesday, March 6th, 1:30pm (CST). Please access www.webcasting.com/pittcon.com for webcast registration information.
Veeco Instruments Inc., headquartered in Plainview, New York is a worldwide leader in metrology tools for the data storage, semiconductor and research and scientific markets; and process equipment etch and deposition tools for the data storage and opto-telecommunications markets. Manufacturing and engineering facilities are located in New York, California, Colorado, Virginia, and Arizona. Global sales and service offices are located throughout the United States, Europe, Japan and Asia Pacific.