Metrology & Instrumentation
Epitaxial Equipment
Process Equipment
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Epitaxial Equipment
MBE Components - Systems

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Epitaxial Equipment
CBr4 Gas Flow Control System - Ultimate control solution for carbon doping
CBr4 Gas Flow Control System
New
 
 

Features:

  • Closed-loop pressure control
  • Pneumatically operated series of on/off valves
  • Interlocking mechanisms
  • Two modes of operation: LOCAL and REMOTE
  • Option to include independent plumbing to introduce H2 gas into a Atomic Hydrogen Source

Benefits:

  • Maximum CBr4 gas control prevents equipment damage and ensures peek performance
  • Means to enhance atomic surface mobility
Phosphorus Recovery System - Efficient, safe means of trapping & neutralizing white phosphorus
Phosphorus Recovery System  
 

Features:

  • Compact unit directly connects to growth module via isolated gate valve
  • Two models to accommodate R&D and production applications

Benefits:

  • Virtually eliminates the danger of phosphorus auto-ignition
  • Easy integration with MBE system
Phosphorus Valved Cracker Temperature Controller - Accurate and stable control of flux instabilities
Phosphorus Valved Cracker Temperature Controller  
 

Features:

  • Stabilizes white zone temperature and flux
  • Compatible with all previous and current Veeco Valved Crackers

Benefits:

  • Simplifies the source process settings
  • Constant white zone temperature ensures flux stabilities
Automated Valve Positioner - Precise, reproducible, automated flux control
Automated Valve Positioner  
 

Features:

  • Can be used with Veeco Valved Crackers 
  • Automated remote control or local manual control of a servo motor can be used to drive the valve
  • Easily integrated with MBE growth control software

Benefits:

  • Provides precise and reproducible flux control through the source needle valve
  • Cost-effective and flexible in many different applications
  • Can function unattended
Growth Stage Positioner - Precise, accurate, reproducible positioning
Growth Stage Positioner
New
 
 

Features:

  • Can be used with Veeco manipulators
  • Automated remote control or local manual control of independent servo motors is used to drive substrate positioning and rotation
  • Easily integrated with MBE growth control software

Benefits:

  • Provides precise, accurate and reproducible positioning and rotation of substrate
  • Directly interfaces with substrate manipulator for optimal closed-loop control and feedback
  • Can function unattended
UNI-Bulb RF Plasma Source Autotuner - Automated solution for MBE plasma source optimization
UNI-Bulb RF Plasma Source Autotuner  
 

Features:

  • Permits hands-free operation using new plasma autotuning unit
  • Automatically adjusts and maintains optimal plasma source conditions
  • Directly replaces Veeco manual tuner, works with existing power supplies
  • Based on popular, proven material delivery system for oxide and nitride applications  

Benefits:

  • No need for manual adjustments during experimentation
  • Ideal for automating processes in which operating conditions (e.g., gas flow, power level) frequently change
  • Ensures stable growth conditions plus exceptional stability, reproducibility and energy-efficiency
Growth Control & Scheduling Software for MBE Systems - The complete solution for process control
Growth Control & Scheduling Software for MBE Systems  
 

Features:

  • EpiTrend "always-on" data archiver and display allows comparison of current and historical data
  • LiberatorTM feature lets you review logs and data offline
  • Recipe checking and diagnostics allow setup and readiness verification
  • Highly flexible lot and run sheets, with easy configuration to automatically control platen transfer from module to module
  • Lot Manager can initiate user-defined growth recipes

Benefits:

  • Maximized system uptime and usability
  • More precise control over programming
  • Easy-to-use, robust platform for controlling Veeco's automated production MBE systems 
  • Minimized downtime and product scrap
  • Expandable and upgradeable
DC Power Supply with PID Temperature Controller - Versatile MBE power and temperature control
DC Power Supply with PID Temperature Controller  
 

Features:

  • Complete line of DC power supplies includes integrated PID temperature controllers
  • Designed for either closed-loop temperature or power feedback and standalone or stack configuration
  • Compatible with all Veeco effusion cells
  • Certified for all major regulatory compliance standards
  • 4-year parts and labor warranty

Benefits:

  • Superior reliability and dependability in a range of applications
  • Accurate, reliable operation of MBE source and substrate heaters
  • Offer excellent flux stability for MBE sources
  • Stack configuration for applications where power requirement is greater than a single power supply can provide
MBE Crucibles - PBN solutions for every application
MBE Crucibles  
 

Features:

  • Complete range of PBN crucibles for MBE available from Veeco
  • Veeco PBN crucibles include unique products for Veeco SUMO cells
  • Ideal for use in dual filament, modified filament, standard filament, low temperature, dopant, and SUMO cells

Benefits:

  • SUMO cell crucibles increase charge carrying capacity for key sources
  • Mupltiple proven, reliable PBN crucibles available for virtually any MBE application
MBE Heated Viewports - Control and monitoring that conventional viewports can't match
MBE Heated Viewports  
 

Features:

  • Heated viewports prevent coating of optical ports in MBE systems
  • Optional tabletop DC power supply available
  • Heating range from room temperature to >500° Celsius
  • 7m fully bakeable cable included

Benefits:

  • Continuous, real-time feedback control of crystal growth via in-situ monitoring
  • More reliable than conventional, unheated viewports
  • No need to vent system to clear As4 coatings
  • Easily adaptable to individual MBE production needs
MBE Linear Motion Shutters - Faster action, longer life
MBE Linear Motion Shutters  
 

Features:

  • Fast-action (50 ms open or close) alternative to integral shutters for controlling beam flux in MBE systems
  • Shutter dampened to reduce shock and vibration
  • Action is bellows-sealed and pneumatically driven

 

Benefits:

  • Reliable and durable -- designed for more than 1 million cycles
  • Pneumatic actuator prevents interference with RHEED or other sensitive analytical equipment
  • Guarded shaft prevents condensed evaporant from clogging the actuator
MBE Shutter Controllers - Accurate control for any application
MBE Shutter Controllers  
 

Features:

  • Provides precise control of shutter position in Veeco MBE effusion cell, source flange, and integral shutters
  • Choice of manual (via front panel switches) or remote (via TTL-compatible computer inputs) control
  • Can be paired with air distribution system to drive shutters
  • Shutters actuated by two separate pneumatic lines
  • Opening and closing pressures independently regulated

Benefits:

  • Flexible design -- can be configured to fit specialized laboratory needs
  • Applicable to a wide range of Veeco MBE systems
  • Solenoid-driven, two-way manifolds enable pneumatic distribution
MBE Source Flanges - For deposition processes in UHV reactors
MBE Source Flanges  
 

Features:

  • Enable users to add MBE-quality deposition capabilities to UHV reactors
  • Compatible with a wide variety of MBE sources to grow multiple types of epitaxial films
  • Available in wide range of styles including the most common ("source-to-substrate" distances ~4"-10"/102mm-254mm)

Benefits:

  • Can greatly expand laboratory capabilities
  • Well suited to a wide variety of source-to-substrate distances
  • Source flanges available to fit every application
Substrate Heaters - TAILORED FOR SPECIFIC TEMPERATURE AND GROWTH ENVIRONMENTS
Substrate Heaters  
 

Features:

  • PBN-constructed diffuser plate
  • Robust wire filament available in multiple materials and optional dual filament design
  • Optimized filament surface area and heat shielding
  • Diffuser material for alternative growth enviroments 
  • Available as direct replacement for common MBE systems

Benefits:

  • Excellent thermal uniformity
  • Prevents hot spot formation
  • Reduces power consumption by as much as 50%
  • Clean operation
  • Optimal reliability and reproducibility
  • Corrosion-resistant designs available
MBE System Cables - For cleanroom-compatible, high-temperature performance
MBE System Cables  
 

Features:

  • Complete line of cables for connecting controllers and MBE effusion cells
  • Made of heavy gauge Teflon-coated wire and shielded thermocouple extension
  • Fully cleanroom-compatible
  • Cables bakeable to 200º C

Benefits:

  • Safe, reliable operation with high current-carrying capacity and high operating temperatures
  • Suited to a wide range of applications
  • No need to remove cables from the MBE system prior to bakeout
UNI-Block MBE Substrate Holders - More flexibility, less particulate generation
UNI-Block MBE Substrate Holders  
 

Features:

  • Rapid (<30 seconds) mounting of full or partial substrates in the same holder ring
  • No wires or clips to install; substrate faces downward at all times
  • Fabricated from a single piece of molybdenum
  • Configurations available to accommodate partial wafers and diffuser plates 

Benefits:

  • Minimum particulate generation and reduced substrate exposure to the environment
  • Maximized ease of use and durability
  • Adaptable to a wide range of MBEsystem needs