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The Veeco MOCVD Advantage

mocdv unit Only Veeco MOCVD offers today’s high brightness light emitting diode (HB LED) manufacturers the unique technology, in-depth support and industry-leading innovation needed to meet the surging demand for backlighting, general illumination, automotive and other lighting applications. The newly-introduced TurboDisc K465i GaN MOCVD System demonstrates how Veeco will drive down the cost of HB LEDs to accelerate penetration into these multiple applications.
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MOCVD Leadership with Veeco

  • Industry-leading equipment supplier with over 25 years experience in production-proven MOCVD technology
  • More than 25 locations worldwide for local service, including on-call equipment maintenance engineers and spare parts suppliers
  • Proven expertise in ramping multiple industries (semiconductor, data storage) to full-scale industrial production
 
Veeco MOCVD: Count On
Our Commitment

Veeco is committed to ensuring you are equipped to meet the surging HB LED demand. With over 25 years experience bringing reliable, productive MOCVD systems to the market, we will support your ramp to new levels of production:

  • Continued commitment to on-time delivery
  • Global resources in place to maintain system production availability and maximize throughput capabilities
  • Direct process support available from renowned Veeco applications laboratory
Research: Driving MOCVD Discovery

Veeco MOCVD scientists and engineers have been responsible for more than 25 years of innovation in metal organic vapor deposition science and developments in new MOCVD manufacturing techniques.

Exclusive Technology
Drives Productivity

TurboDisc Veeco’s proprietary technology combines unique laminar flow, reactor design and automated hot carrier transfer to set the industry standard for non-stop productivity and excellent yields for HB LED manufacturing.
Watch TurboDisc K465i GaN MOCVD System Animation

TurboDisc® Technology: Production-proven platform assures excellent uniformity, high throughput and exceptional production yields

Uniform FlowFlange®: Features alternating flows of alkyl and hydride gases uniformly across the wafer carrier

RealTemp® Technology: RealTemp temperature control allows real-time monitoring and control of the process, engineered for highly accurate measurement

DTR-210 In-Situ Process Monitoring: Combines deflectometry, reflectometry and temperature measurements during MOCVD GaN epitaxial growth runs to achieve highly uniform and repeatable growth cycles.
More on Veeco MOCVD systems.

Key Announcements
News

Shanghai Epilight Selects Veeco's MOCVD Systems for Its LED Manufacturing Capacity Ramp
July 22, 2010

Veeco Ships MOCVD Systems to Support Invenlux's Production Ramp at Its China LED Factory
July 21, 2010

Arima Selects Veeco MOCVD Systems to Support Production Ramp
July 19, 2010

Neo-Neon Places Initial Order for Veeco K465i MOCVD System
July 16, 2010

Epistar of Taiwan Qualifies Veeco MOCVD System for High Volume Production
May 20, 2010

Archived News

Application Notes

Use of In-Situ Deflectometer Metrology for GaN MOCVD Reduces Development Time and Optimizes Product Yield - [416 KB PDF]

Upcoming Conference Participation

October 14 - 16, 2010. China SSL. Shenzhen, China

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