E450 As/P MOCVD System
Reliable production of ROY HB-LEDs, triple junction solar cells and more
Achieve reliable mass production of HB-LEDs, triple junction solar cells, HBTs and pHEMTs with Veeco's high capacity E450 AsP metal organic chemical vapor disposition (MOCVD) production system. This system's features give you low cost of ownership plus outstanding thickness, doping and composition uniformity and the latest advances in deposition technology. Another advantage is exclusive TurboDisc® technology, utilizing a vertical growth chamber configuration for exceptional thickness, doping, and composition uniformity.
- Description
- Application
Notes
TurboDisc E450 As/P MOCVD System
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- Growth chamber and FlowFlange® designs provide exceptional thickness, doping, and composition uniformity
- RealTemp® 200 control technology allows in-situ monitoring and control of wafer temperature plus unprecedented run-to-run process control repeatability
- Innovative growth chamber design allows high-volume production while conserving resources
- Low production costs due to large batch sizes, minimal time between runs, and unmatched process control
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To view and download application notes pdf files, select the title below. If you can't view the pdf,
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- Enhancing the Efficiency of InGaN-based LEDs by Optimizing MOCVD Growth Using AFM and SCM Technologies - [October 2004]
- Optical Efficiency Enhancement of InGaN/GaN Multiple Quantum Well LEDs Based on AFM Morphological Studies of the Active Regions - [May 2004]