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Epitaxial Equipment
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Epitaxial Equipment
MOCVD Systems - Systems

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Epitaxial Equipment
TurboDisc K465i GaN MOCVD System - Lowest CoO, Highest Productivity, Best-in-Class Yields
TurboDisc K465i GaN MOCVD System
New
 
 

Features:

  • Uniform FlowFlange® technology results in superior uniformity and repeatability
  • Low maintenance TurboDisc technology enables highest system availability

 

 

Benefits:

  • Lowest cost of ownership GaN MOCVD system
  • Industry's highest productivity due to full automation and one-run recovery period after maintenance
TurboDisc K465 GaN MOCVD System - Automated for highest production, most profitability
TurboDisc K465 GaN MOCVD System  
 

  Features:

  • Shares its platform with the proven Veeco K300 MOCVD system -- designed for superior throughput
  • Advanced TurboDisc® reactor technology, high velocity laminar flow, and clean operation eliminates the need for in-situ bakes

  Benefits:

  • Delivers the industry's highest throughput for high-volume production of GaN-based blue and green LEDs and blue lasers
  • Automated platform produces more profit for HB-LED manufacturers while controlling capital cost
  • Excellent production yields, uniformity, and repeatability
TurboDisc K475 As/P MOCVD System for Solar - Industry's Most Reliable Platform Enables Highest Volume Triple Junction Solar Cells
TurboDisc K475 As/P MOCVD System for Solar
New
 
 

Features:

  • Low maintenance TurboDisc technology enables highest uptime
  • Vacuum loadlock minimizes idle time for highest production throughput
  • RealTemp 200 temperature control ensures accurate process reproducibility
  • FlowFlange enables excellent uniformity and repeatability for high production yield

 

Benefits:

  • Highest volume of triple junction solar cells
  • Highest profit for triple junction solar cell manufacturers
  • Excellent uniformity, high throughput and exceptional production yields
  • Module design for ease of maintenance and upgradeability
  • Fast thermal ramping and high growth rates
TurboDisc E475 As/P MOCVD System - Enabling highest volume production of premium devices
TurboDisc E475 As/P MOCVD System  
 

  Features:

  • Industry's leading throughput for high-volume production of multi-junction III-V concentrator solar cells, HB-LEDs, laser diodes, pHEMTs and HBTs
  • Low-maintenance TurboDisc® technology enables highest uptime
  • Integrated RealTemp® 200 technology provides direct wafer temperature control, fast gas switching and strict control of interface abruptness

  Benefits:

  • Ideal for mass production of HB-LED and concentrator solar cells
  • Superior material quality and process efficiency plus high productivity
  • High return on investment for HB-LEDs and III-V concentrator solar cells
D180 GaN MOCVD System - Exceptional GaN material development and production
D180 GaN MOCVD System  
 

  Features:

  • In-situ monitoring plus user-friendly control and monitoring software package for real-time temperature and growth rate calibration
  • Advanced growth chamber heating components
  • Gas line purifiers remove particulate, moisture and molecular contaminants

  Benefits:

  • Accurate, precise reactant delivery and strict control of uniformity
  • Casette elevator holds up to 3 wafer carriers for transfer to growth chamber
  • Maximum throughput and accuracy; minimized downtime and maintenance
  • Rapid heat up/cool down times between runs
D180 LDM MOCVD System - Unmatched process control for laser diode materials
D180 LDM MOCVD System  
 

  Features:

  • Cassette elevator holds up to 3 wafer carriers for transfer to growth chamber; multiple wafer carrier options available
  • Advanced growth chamber components
  • Patented FlowFlange technology
  • Gas line purifiers remove contaminants

  Benefits:

  • Precise reactant delivery and strict control of uniformity, layer thickness and interface abruptness
  • Minimal particulate accumulation and low maintenance operation
  • Reduced operation costs and optimum device yield with reduced risk of contamination
  • Fast heat up/cool down times between runs
E300 LDM MOCVD System - Reliable production of long wavelength, infrared and visible lasers
E300 LDM MOCVD System  
 

Features:

  • Specially designed for high-volume production of lasers, VCSELs, and InP-based materials
  • Advanced growth chamber heating components
  • Integrated glove box for loading/unloading wafers

Benefits:

  • High throughput, low maintenance and reduced risk of contamination
  • Precise reactant delivery and strict control of uniformity, layer thickness and interface abruptness
  • Optimized device yield and repeatability
  • Fast heat up/cool down times between runs
E450 As/P MOCVD System - Reliable production of ROY HB-LEDs, triple junction solar cells and more
E450  As/P MOCVD System  
 

  Features:

  • Engineered for high-volume production of molecular beam epitaxy materials
  • Features next-generation growth chamber and FlowFlange® technology including vertical chamber configuration
  • Allows in-situ monitoring and control of wafer temperature during production runs

  Benefits:

  • Repeatability and reliability levels formerly unavailable for large-scale MOCVD production
  • Exceptional material quality, thickness, doping, process efficiency, and throughput
  • Precise control of reactant delivery, uniformity, layer thickness and interface abruptness
  • Reduced contamination risk
Pioneer P125 MOCVD System - R&D MOCVD system deposits a wide range of materials
Pioneer P125 MOCVD System  
 

Features:

  • Incorporates latest developments in MOCVD technology
  • Versatile -- can deposit a range of semiconductor materials, metals, and oxides
  • Smooth and stable flow conditions due to optimal control of growth chamber pressure, gas flow and rotation speed
  • User-friendly monitoring and control ensures stable run-to-run temperatures

Benefits:

  • The most flexible and powerful tool available for research-level epitaxial deposition
  • Vertical growth chamber configuration for low maintenance and high uptime
  • Precise reactant delivery and strict control of uniformity, layer thickness and interface abruptness
  • Optimized device yield, throughput, and repeatability
TurboDisc K300 GaN MOCVD System - Fully automated platform for producing HB-LEDs and lasers
TurboDisc K300 GaN MOCVD System  
 

Features:

  • The only fully automated MOCVD platform available today
  • High velocity laminar flow and clean operation of TurboDisc® technology eliminates the need for in-situ bakes
  • Production-proven GaNzilla II reactor plus a platform specifically designed for expandability and configurability

Benefits:

  • Ideal for producing GaN-based materials for blue and green LEDs and blue lasers
  • Expandable, flexible and configurable
  • Excellent production yields and high throughput
  • Allows simple and cost-effective performance upgrades plus 20% -30% more profit potential