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Epitaxial Equipment
MOCVD Systems - Systems

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Epitaxial Equipment
TurboDisc K465i GaN MOCVD System - Highest Productivity and Best-in-Class Yields
TurboDisc K465i GaN MOCVD System
New
 
 

Features:

  • Uniform FlowFlange® technology results in superior uniformity and repeatability
  • Low maintenance TurboDisc technology enables highest system availability

 

 

Benefits:

  • Production-proven GaN MOCVD System
  • Industry's highest productivity due to full automation and one-run recovery period after maintenance
TurboDisc K465 GaN MOCVD System - Automated for highest production, most profitability
TurboDisc K465 GaN MOCVD System  
 

  Features:

  • Shares its platform with the proven Veeco K300 MOCVD system -- designed for superior throughput
  • Advanced TurboDisc® reactor technology, high velocity laminar flow, and clean operation eliminates the need for in-situ bakes

  Benefits:

  • Delivers the industry's highest throughput for high-volume production of GaN-based blue and green LEDs and blue lasers
  • Automated platform produces more profit for HB-LED manufacturers while controlling capital cost
  • Excellent production yields, uniformity, and repeatability
TurboDisc K475 As/P MOCVD System for Solar - Industry's Most Reliable Platform Enables Highest Volume Triple Junction Solar Cells
TurboDisc K475 As/P MOCVD System for Solar
New
 
 

Features:

  • Low maintenance TurboDisc technology enables highest uptime
  • Vacuum loadlock minimizes idle time for highest production throughput
  • RealTemp 200 temperature control ensures accurate process reproducibility
  • FlowFlange enables excellent uniformity and repeatability for high production yield

 

Benefits:

  • Highest volume of triple junction solar cells
  • Highest profit for triple junction solar cell manufacturers
  • Excellent uniformity, high throughput and exceptional production yields
  • Module design for ease of maintenance and upgradeability
  • Fast thermal ramping and high growth rates
TurboDisc E475 As/P MOCVD System - Enabling highest volume production of premium devices
TurboDisc E475 As/P MOCVD System  
 

  Features:

  • Industry's leading throughput for high-volume production of multi-junction III-V concentrator solar cells, HB-LEDs, laser diodes, pHEMTs and HBTs
  • Low-maintenance TurboDisc® technology enables highest uptime
  • Integrated RealTemp® 200 technology provides direct wafer temperature control, fast gas switching and strict control of interface abruptness

  Benefits:

  • Ideal for mass production of HB-LED and concentrator solar cells
  • Superior material quality and process efficiency plus high productivity
  • High return on investment for HB-LEDs and III-V concentrator solar cells
TurboDisc E450 As/P MOCVD System - Reliable production of ROY HB-LEDs, triple junction solar cells and more
TurboDisc E450  As/P MOCVD System  
 

  Features:

  • Engineered for high-volume production of molecular beam epitaxy materials
  • Features next-generation growth chamber and FlowFlange® technology including vertical chamber configuration
  • Allows in-situ monitoring and control of wafer temperature during production runs

  Benefits:

  • Repeatability and reliability levels formerly unavailable for large-scale MOCVD production
  • Exceptional material quality, thickness, doping, process efficiency, and throughput
  • Precise control of reactant delivery, uniformity, layer thickness and interface abruptness
  • Reduced contamination risk