Process Equipment
Ion Beam Deposition - Systems

Features:

• Deposits extremely thin single and multi-layer film coatings
• Designed for low particulate deposition
• Based on award-winning technology
• For single module function or as part of cluster tool

Benefits:

• High performance, production-worthy system
• Offers excellent uniformity, high repeatability and angstrom-level accuracy
• Ideal for phase shift masks and extreme ultra violet (EUV) masks

Features:

• Robust planetary fixture design
• 16cm RF high-power deposition source
• Ultra-low contamination RF neutralizers

Benefits:

• Ion beam quality with industry-leading throughput provides the lowest cost of ownership
• Exceptional material uniformity across 400mm planets ensures maximum product yield
• High current RF ion sources provide excellent deposition rates
• Maximum product flexibility provided by large substrate and palette support

Features:

• Broad range of precision coating applications
• Interchangeable platform accommodates planetary, simple rotation, or flip fixtures
• Low-pressure operation provides high film purity
• State-of-the-art process control platform

Benefits:

• Meets the needs of virtually every optical thin film application
• Superior film thickness control
• Provides telecom devices that meet stringent characteristic specifications
• High energy ion beam deposition process offers better packing density and low pin-hole density

Features:

• Improved CD control for all collimated deposition applications
• Sharper takeoff angle through symmetrical arrival of the deposition plume
• Platform allows for easy integration with PVD, IBE and other technologies

Benefits:

• Dramatically increase yield of 80Gb/in² sensors
• Ideal for MRAM applications as well as GMR and TMR thin film magnetic heads
• Supports wide range of devices, from current CIP to advanced CPP devices