Metrology & Instrumentation : AFM / SPM

When measuring at these small scales, ground vibration and/or acoustic noise can be significant and can affect measurements substantially. To combat this, Veeco offers two products, the VT-103-3K Acoustic/Vibration Isolation System and the VT-102 Vibration Isolation Table.

Electrochemistry STM/AFM/SECPM combines SPM with electrochemical control to study surface structure, properties, and reactivity of the electrode surface at the electrochemical interface. Studies may be conducted in situ, imaging surfaces in an electrochemical solution with or without potential control of an integrated potentiostat/galvanostat, or ex situ, imaging surfaces before and after the electrode is exposed to the electrolyte solution.

Click here for datasheet [pdf]

VITA (Veeco Instruments Thermal Analysis) technology adds high resolution thermal characterization capabilities to existing Veeco Scanning Probe Microscopes (SPM).

Now SPM users not only benefit from unmatched core performance, but can add a
traditional bulk characterization technique. The VITA option builds on Veeco’s extensive expertise with thermal measurements — providing extended thermal measurement
performance through:

• Improved lateral resolution capabilities (to <100 nm)
• Full digital control of heating cycles
• Productive VITA control integration enabled by Veeco systems open architecture

VITA technology provides superior material characterization in two ways:

• Nanoscale Thermal Analysis
• Scanning Thermal Microscopy

Veeco Instruments Thermal Analysis Webinar

Presenter: Thomas Mueller

Duration approx. 52 minutes

File size 48 MB

View it Now!

Install the GotoMeeting Codec to play the webinar video

VITA - Veeco Instruments Thermal Analysis Application Note

• High Res [1.1 MB pdf ]

• VITA Scanning Thermal Analysis
  
  Low Res [262 KB pdf ]

The NanoDrive controller platform is built on modern state-of-the-art technology and while entirely new from the ground up, also incorporates 20 years of experience only available from the SPM market leader. 

The NanoDrive controller includes two fully independent lock-in amplifiers enabling advanced imaging modes such as scanning capacitance microscopy and surface potential microscopy with maximum productivity and flexibility while completely eliminating the need for external hardware. Thorough optimization of the controller architecture ensures maximum performance and stability while minimizing computer requirements. Eight fast ADCs working in parallel offer generous data acquisition bandwidth with up to 8 images and 1024 x 1024 pixels each. The NanoDrive controller offers a 3-axis stage control, used in Innova for pitch and tilt capabilities. The built-in high-voltage supply enables unipolar tube driving, thus eliminating the danger of piezo depoling. It provides the wide dynamic range and low noise floor demanded by high performance AFMs.

The software available with the NanoDrive controller platform includes Veeco’s intelligent tip approach and our patented lift mode for efficient basic and advanced imaging. Powerful research flexibility beyond established SPM modes comes standard with advanced signal diagnostics and generic signal sweep functions for custom experiments. Software configurable inputs and outputs built into the controller provide extensive signal access and are further augmented by software controlled, user accessible signal routing. Three digital feedback loops are entirely software configurable by the user and form the foundation for the ultra-low noise position control.

Conductive Atomic Force Microscopy (CAFM) is a secondary imaging mode derived from contact AFM that characterizes conductivity variations across medium- to low-conducting and semiconducting materials. CAFM performs general-purpose measurements, and has a current range of 2 pA to 1 µA. CAFM employs a conductive probe tip. Typically, a DC bias is applied to the tip, and the sample is held at ground potential. While the z feedback signal is used to generate a normal contact AFM topography image, the current passing between the tip and sample is measured to generate the conductive AFM image.



Current flow in conductive AFM (CAFM).

In contact AFM, the tip is in perpetual contact with the sample. The tip is attached to the end of a cantilever with a low spring constant, lower than the effective spring constant holding the atoms of most solid samples together. As the scanner gently traces the tip across the sample (or the sample under the tip) union the contact force causes the cantilever to bend and the Z-feedback loop works to maintain a constant cantilever deflection.

Electric Force Microscopy (EFM) is a secondary imaging mode derived from TappingMode that measures electric field gradient distribution above the sample surface. This is performed through LiftMode. In EFM, a voltage may be applied between the tip and the sample. The cantilever's resonance frequency and phase change with the strength of the electric field gradient and are used to construct the EFM image. For example, locally charged domains on the sample surface are mapped in a way that is similar to how MFM maps magnetic domains.



EFM

Force Modulation imaging is a secondary imaging mode derived from contact AFM that measures relative elasticity/stiffness of surface features, and is commonly used to map the distribution of materials of composite systems. As with LFM and MFM, Force Modulation imaging allows simultaneous acquisition of both topographic and material-property maps.

In Force Modulation imaging mode, the probe tip tracks the sample topography as in normal contact AFM.  In addition, a periodic signal mechanically drives the cantilever (and tip) in the Z-direction.  The amplitude of cantilever modulation that results from this applied signal varies according to the elastic properties of the sample

The resulting force modulation image is a map of the sample’s elastic response. The frequency of the applied signal is typically a few kilohertz, which is faster than the z feedback loop is set up to track. Thus, topographic information can be separated from local variations in the sample’s elastic properties, and the two types of images can be collected simultaneously, as shown below.



Contact-AFM (left) and Force Modulation (right) images of a carbon fiber/polymer composite collected simultaneously.
5µm scan.

Force-Distance Measurements are performed to study attractive and repulsive forces on a tip as it approaches and retracts from the sample surface. Commonly applied to investigating fundamental force interactions, nano-scale adhesive and elastic response, binding forces, colloidal studies, and chemical sensing.

Magnetic Force Microscopy (MFM) is a secondary imaging mode derived from TappingMode mode that maps magnetic force gradient above the sample surface. This is performed through a patented two-pass technique, LiftMode. LiftMode separately measures topography and another selected property (magnetic force, electric force, etc.) using the topographical information to track the probe tip at a constant height (Lift Height) above the sample surface during the second pass.




Lift Mode AFM.
The MFM probe tip is coated with a ferromagnetic thin film. While scanning, it is the magnetic field’s dependence on tip-sample separation that induces changes in the cantilever’s resonance frequency or phase. MFM can be used to image both naturally occurring and deliberately written domain structures in magnetic materials. An image of a hard disk acquired in MFM mode is shown.

Phase imaging is a secondary imaging mode derived from TappingMode that goes beyond topographical data to detect variations in composition, adhesion, friction, viscoelasticity, and other properties, including electric and magnetic. Applications include contaminant identification, mapping of components in composite materials, differentiating regions of high and low surface adhesion or hardness and regions of different electrical or magnetic properties.
Phase imaging is the mapping of the phase lag between the periodic signal that drives the cantilever and the oscillations of the cantilever. Changes in the phase lag often indicate changes in the properties of the sample surface.



The phase lag varies in response to the properties of the sample surface.

The system's feedback loop operates in the usual manner, using changes in the cantilever's oscillation amplitude to map sample topography. The phase lag is monitored while the topographic image is being taken so that images of topography and material properties can be collected simultaneously.




This figure shows simultaneously acquired topography (left) and phase (right) AFM images of silicone hydrogel in saline solution. The four outer areas were exposed to a sequence of chemical processing steps. The central cross-like region was masked and so protected from the processing steps and hence retained its hydrophobicity.

In the phase image (right) union a marked phase shift is clearly seen across the boundaries. However, the hydrophilic and hydrophobic regions show no topographic contrast (left). The phase image is clearly providing material property contrast on this well-defined experimental hydrogel surface.

The phase signal is sensitive to both short- and long-range tip-sample interactions. Short-range interactions include adhesive forces and visco-elastic forces; long-range include electric fields and magnetic fields.

Phase imaging is a key element in the use of a number of scanning probe techniques, including Magnetic Force Microscopy (MFM) union Electric Force Microscopy (EFM) and Scanning Capacitance Microscopy (SCM). This method of detection provides a more sensitive measurement than other detection methods, such as amplitude detection.

Scanning Capacitance Microscopy (SCM) is a secondary imaging mode derived from contact AFM that maps variations in majority electrical carrier concentration (electrons or holes) across the sample surface (typically a doped semiconductor). An AC bias voltage is applied between the tip and sample. The tip scans across the sample surface, and changes in capacitance between the tip and the sample surface are monitored by an extremely sensitive high-frequency resonant circuit.

SCM is commonly used for two-dimensional profiling of dopants in semiconductor process evaluation and failure analysis.



Contact Mode topography (left) and SCM dC/dV images of a cross-sectioned transistor in a Pentium-II chip. 1.25µm scans.

Scanning Tunneling Microscopy (STM) measures topography of surface electronic states using a tunneling current that is dependent on the separation between the probe tip and a sample surface. STM is typically performed on conductive and semiconductive surfaces. Common applications consist of atomic resolution imaging, electrochemical STM, Scanning Tunneling Spectroscopy (STS) union and low current imaging of less conductive samples.

Surface Potential (SP) imaging is a secondary imaging mode derived from TappingMode that maps the electrostatic potential on the sample surface. SP is a nulling technique. As the tip travels above the surface in LiftMode (see “Magnetic Force Microscopy” for description of LiftMode) union the tip and the cantilever experience a force wherever the potential on the surface is different than the potential of the tip. The force is nullified by varying the voltage of the tip so that the tip is at the same potential as the region of the sample surface underneath it. SP imaging can be used to detect and quantify contact potential differences (CPD) on the surface.



TappingMode Topography (left) and Surface Potential (Right) images of an area on a CD-RW. The bits are depicted only in the Surface Potential image. 5µm scans, courtesy Yasudo Ichikawa, Toyo Corp. Japan.

TappingMode AFM, the most commonly used of all AFM modes, is a patented technique (Veeco Instruments) that maps topography by lightly tapping the surface with an oscillating probe tip. The cantilever’s oscillation amplitude changes with sample surface topography, and the topography image is obtained by monitoring these changes and closing the z feedback loop to minimize them.

TappingMode has become an important AFM technique, as it overcomes some of the limitations of both contact and non-contact AFM. By eliminating lateral forces that can damage soft samples and reduce image resolution, TappingMode allows routine imaging of samples once considered impossible to image with AFM, especially in contact mode.

Another major advantage of TappingMode is related to limitations that can arise due to the thin layer of liquid that forms on most sample surfaces in an ambient imaging environment, i.e., in air or some other gas. The amplitude of the cantilever oscillation in TappingMode is typically on the order of a few 10’s of nanometers, which ensures that the tip does not get stuck in this liquid layer. The amplitude used in non-contact AFM is much smaller, as different forces are being measured. As a result, the non-contact tip often gets stuck in the liquid layer unless the scan is performed at a very slow speed.

In general, TappingMode is much more effective than non-contact AFM for imaging larger scan sizes that may include large variations in sample topography. TappingMode can be performed in gases, liquids, and some vacuum environments.