Ion Sources
Gridless End-Hall Ion Sources - Systems

Features:

• Designed for vacuum coating processes
• Compact size for systems of 750mm diameter or less
• Effective for use with applications requiring high current, low-energy ions

Benefits:

• High beam current improves process uniformity and prevents substrate dama
• Delivers uniform performance in surface pre-clean, assisted deposition and select etch applications

Features:

• Designed for small R&D and pilot production systems
• Suitable for reactive and inert gases and high power densities
• Effective for use with applications requiring high current, low-energy ions

Benefits:

• High beam current improves process uniformity and prevents substrate damage
• Compact size helps toolbuilders save space
• Controlling film stress and stochiometry improves thin film process yield

Features:

• High beam current controls film stress and stoichiometry
• Suitable for reactive and inert gases and high power densities
• Effective for use with applications requiring high current, low-energy ions

Benefits:

• Improves process uniformity and prevents substrate damage
• Compact size helps toolbuilders save space
• Supports broad application base

Features:

• High beam output enhances control of film stress and stoichiometry
• Suitable for reactive and inert gases and high power densities
• Most widely used assist source for optical coating systems

Benefits:

• Space-saving design helps toolbuilders control coating systems footprint
• High beam current improves process uniformity and prevents substrate damage
• Supports broad application base

Features:

• Up to 70% greater beam current for higher-rate processes and larger chambers
• Removable anode assembly enables quicker maintenance and less downtime
• Integrated feedthroughs and cabling for ease-of-installation and reliability

Benefits:

• Improved design enables use in higher-rate processes and larger chambers
• Smaller form factor uses same mounting plate as Mark II sources for faster upgrades
• Flexible integration permits space-saving system design and broad beam angle

Features:

• For chambers from 70-130 cm in diameter
• Provides improved control of film stress and stoichiometry
• Water-cooled

Benefits:

• Improved design enables use in higher-rate processes and larger chambers
• Well-suited to precision or industrial optical coating environments
• Flexible integration permits space-saving system design and broad beam angle

Features:

• State of the art switching supplies
• Integrated gas control and automated arc recovery
• User-friendly graphical interface

Benefits:

• Stable and reliable power maximizes ion source performance
• Automation features enhance process productivity
• Helps ensure highly productive process runs and better yields