Ion Sources
Gridded DC Ion Sources - Systems

Features:

• Well-suited for non-reactive processes
• Designed for smaller geometric vacuum systems
• For cleaning, etching, texturing, sputtering and enhanced deposition

Benefits:

• Low power provides economic operation with raidant cooling
• Easy to install, clean and maintain
• Provides economical operation in both long and short duration runs

Features:

• Uses include enhanced deposition, texturing, cleaning, and sputtering
• Well-suited source for non-reactive processes
• Specifically designed for vacuum systems with compact device footprints

Benefits:

• Low power functionality and radiant cooling provides economic operation
• Filaments and grids easily accessible for efficient maintenance
• Design helps control costs for both long and short duration runs

Features:

• Mid-size source with low to moderate power operation
• Water-cooled
• Designed for operations from 50 to 2000ev and 20 to 200mA

Benefits:

• Flexible source enables wide range of low and moderate power operations
• Designed for easy installation, cleaning and maintenance
• Can be used for both long duration runs in inert environments and short duration runs in reactive environments

Features:

• Works best in non-reactive environments
• Designed for operations from 50 to 1000ev and 30 to 300mA
• Suited for moderate to high energy applications such as cleaning and etch
• Also effective in high energy, high current density deposition processes

Benefits:

• Compact size enables tool builders to control deposition tool footprint
• Easy to install, clean and maintain
• Low to moderate power operation helps control production costs

Features:

• Mid-size ion source typically used for etching and cleaning
• Also effective in ion beam sputter deposition and diamond-like coating (DLC) applications
• Water-cooled
• Works best in non-reactive environments

Benefits:

• Flexible ion source useful for wide range of applications
• Designed for easy installation, cleaning and maintenance
• Supports long duration runs in inert environments and short duration runs in reactive environments

Features:

• Works best in non-reactive environments
• Designed for operations from 50 to 1000ev and 30 to 300mA
• Suited for moderate to high energy applications such as cleaning and etch
• Also effective in high energy, high current density deposition processes

Benefits:

• Radiant cooled for most cost-effective operation
• Easy to install, clean and maintain
• Wide range of uses enhances production flexibility

Features:

• Designed for multiple etch, deposition and assisted deposition uses
• Can be used for both low voltage and high voltage operation
• Integrated water cooling

Benefits:

• Wide range of uses enhances operational value and flexibility
• Designed for fast installation and easy replacement
• Water cooling allows high energy operation for extended periods

Features:

• Provides reliable, cost-effective deposition and etch for large format substrates
• Can be used for both low voltage and high voltage operation
• Integrated water cooling

Benefits:

• Designed for easy cleaning and fast installation
• Multiple applications improve operational value and flexibility
• Water cooling allows high energy operation for extended periods

Features:

• For process platforms utilizing large/wide individual substrates or large substrate batches
• Reliable performance in either linear or cylindrical fixturing
• Provides uniform plasma and high current density

Benefits:

• Same innovative design, quality and reliability as Veeco's round ion beam sources
• Wide beam energy range increases deposition process flexibility

Features:

• 30cm linear source for process platforms utilizing large/wide individual substrates or large substrate batches
• Reliable performance in either linear or cylindrical fixturing
• Provides uniform plasma and high current density

Benefits:

• Same innovative design, quality and reliability as Veeco's round ion beam sources
• Wide beam energy range increases deposition process flexibility

Features:

• 40cm linear ion source for process platforms utilizing large/wide individual substrates or large substrate batches
• Reliable performance in either linear or cylindrical fixturing
• Ensures excellent plasma uniformity and high current density

Benefits:

• Same innovative design, quality and reliability as Veeco's round ion beam sources
• Wide beam energy range increases deposition process flexibility
• Enables more cost-effective ion beam batch deposition processes

Features:

• 50cm linear ion source for large scale platforms utilizing large/wide individual substrates or large substrate batches
• Reliable performance in either linear or cylindrical fixturing
• Ensures excellent plasma uniformity and high current density

Benefits:

• Leverages Veeco's technology leadership in ion beam source design, quality and reliability
• Wide beam energy range increases deposition process flexibility
• Enables more cost-effective ion beam batch deposition processes

Key Features:

• Easy to use single button operation
• Manual, automated and remote operation options
• Integrated and configurable gas flow control
• Customizable control settings for tailored source operation

Key Benefits:

• Cutting-edge control for improved plasma stability
• Time-saving troubleshooting features
• Useful events and status logging screen

Key Features

• Designed for small DC ion sources
• Excellent reliability and precision control
• Easily programmable and features interfaces for remote control
• Versatile options for greater value

Key Features

• Excellent reliability and precision control
• Includes manual, local and remote control features
• Designed for large scale, automated ion deposition operations
• Multiple model options for greater value