Veeco Announces 8th Annual International Nanoscience Conference
March 22, 2010Call for Papers
PLAINVIEW, N.Y., Mar 22, 2010 (BUSINESS WIRE) -- Veeco Instruments Inc. (Nasdaq: VECO), the leading provider of atomic force microscopes (AFMs) to the nanoscience community, announced today that it will host the "Seeing at the Nanoscale VIII" conference at the Congress Center, Basel, Switzerland, August 30-September 1, 2010, as part of the 550th anniversary celebrations of the University of Basel. In its eighth year, the conference has a solid reputation for providing an optimum forum for academic and industrial scientists to share information and exchange ideas on a wide variety of cutting-edge nanotechnology topics, ranging from novel imaging approaches and unique material characterization to combining AFM with other technologies, such as confocal microscopy and Raman spectroscopy.
"Nature is the best example of a system functioning on the nanometer scale, where the involved materials, energy consumption and data handling are optimized," commented Conference Chair Christoph Gerber, Director for Scientific Communication, NCCR, Institute of Physics at the University of Basel. "The emergence of the STM and AFM led to a paradigm shift in the understanding and perception of matter at its most fundamental level, and opened the doors to the nanoworld. Today these technologies are still making a tremendous impact on disciplines ranging from physics and chemistry through information technology, spintronics, quantum computing, and molecular electronics, all the way to life sciences. According to the Web of Science , over 7,000 AFM-related papers were published in 2009 alone, bringing the total to more than 80,000 since its invention. As a consequence, revolutionary concepts have stimulated a wide spread of new technologies in recent years. Veeco's annual Seeing at the Nanoscale conference is therefore a must in the agenda of every nanoscientist."
"I think we can all appreciate how the traditional boundaries of scientific disciplines are blurred at the nanoscale," added Conference Co-Chair Roderick Lim, Argovia Professor for Nanobiology, Biozentrum and the Swiss Nanoscience Institute at the University of Basel. "Not just in the methods of visualizing and manipulating molecular processes, but even more so in how we conceive of new concepts and solve problems. With this in mind, Christoph and I are committed to bringing out the synergies that exist between the physical and biological sciences in our planning of Seeing at the Nanoscale VIII in Basel. We are particularly honored that several of the leading experts who practice such interdisciplinarity have agreed to attend. It is also fantastic that our enthusiasm is shared by our joint organizers: Veeco, the Swiss Nanoscience Institute, the Biozentrum, and the M.E. Müller Foundation of Switzerland. I do urge folks from all walks of science to join us for this remarkable event."
The "Seeing at Nanoscale conference continues the tradition of building the SPM community in leading technology innovation and applications. This year we are excited by the attendance of distinguished speakers and the close proximity of the conference location to the birthplace of SPM technology," remarked Chanmin Su, Director of Technology at Veeco.
Abstracts for oral and poster presentations are now being accepted at http://www.veeco.com/support/nanoconference . Conference sessions for 2010 include:
Nanobio - Molecular Machines and Systems
Invited Speakers: Hermann Gaub (Ludwig-Maximilians Universität München, Germany)
Zhifeng Shao (Shanghai Jiaotong University, China)
: Nanobio - Cells and Tissues
Invited Speakers: Alan Grodzinsky (MIT, USA)
Michael Sheetz (Columbia University, USA, and the National University of Singapore)
: Nanomaterials - Properties: Electric, Magnetic, Chemical, Thermal, Optical
Invited Speakers: Julie MacPherson (University of Warwick, United Kingdom)
Fraser Stoddart (Northwestern University, USA)
Invited Speakers: Greg Meyers (Dow Chemical, USA)
Ernst Meyer (University of Basel, Switzerland)
Advances in SPM Instrumentation: New Instrument Development, High Resolution, Combination of AFM with Other Technologies
Invited Speakers: Gerhard Meyer (IBM Zürich, Switzerland)
Markus B. Raschke (University of Washington, USA)
In conjunction with the 2½-day conference, Veeco will host a half-day training course covering a variety of AFM techniques, including the new, groundbreaking ScanAsyst(TM) and PeakForce QNM(TM) Imaging Modes. Together, these proprietary advances provide unique capabilities for AFM quantitative analysis and ease of use.
More details on the sessions, abstract submissions, and invited speaker presentations may be found at http://www.veeco.com/support/nanoconference/
Veeco Instruments Inc. manufactures enabling solutions for customers in the HB-LED, solar, data storage, semiconductor, scientific research and industrial markets. We have leading technology positions in our three businesses: LED & Solar Process Equipment, Data Storage Process Equipment, and Metrology Instruments. Veeco's manufacturing and engineering facilities are located in New York, New Jersey, California, Colorado, Arizona, Minnesota and Massachusetts. Global sales and service offices are located throughout the U.S., Europe, Japan and APAC. http://www.veeco.com/
To the extent that this news release discusses expectations or otherwise makes statements about the future, such statements are forward-looking and are subject to a number of risks and uncertainties that could cause actual results to differ materially from the statements made. These factors include the risks discussed in the Business Description and Management's Discussion and Analysis sections of Veeco's Annual Report on Form 10-K for the year ended December 31, 2009 and in our subsequent quarterly reports on Form 10-Q, current reports on Form 8-K and press releases. Veeco does not undertake any obligation to update any forward-looking statements to reflect future events or circumstances after the date of such statements.
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