Metrology & Instrumentation
Process Equipment
Epitaxial Equipment
Process Equipment
Physical Vapor Deposition - Systems
NEXUS PVD-1 System
Process module easily configured to meet specific process requirements through the addition of cathodes, wafer chucks, gas manifolds, shutters and pumping packages.
Process module easily configured to meet specific process requirements through the addition of cathodes, wafer chucks, gas manifolds, shutters and pumping packages.
NEXUS PVD-HR System 
Provides flexibility and process tune-ability with the high-rate and reliability requirements of thick overcoat applications.
Provides flexibility and process tune-ability with the high-rate and reliability requirements of thick overcoat applications.
NEXUS PVDi System
Maximum flexibility for a wide range of applications with exceptional uniformity and repeatability
Maximum flexibility for a wide range of applications with exceptional uniformity and repeatability