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Process Equipment
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Process Equipment
Physical Vapor Deposition - Systems

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Process Equipment
NEXUS PVD-1 Physical Vapor Deposition System - Versatile, easy-to-use tool for multiple applications
NEXUS PVD-1 Physical Vapor Deposition System  
 

Features:

  • Easily configured to meet specific process and production requirements
  • Compatible with a wide range of wafer sizes, from 3" to 8" round
  • Tailored to multiple applications in the data storage sector as well as magnetic materials
  • Integrates easily on NEXUS hardware and software platforms

Benefits:

  • Combines simplicity, reliability and excellent vapor deposition system performance
  • Modular platform simplifies training, maintenance requirements and spare part stocking
  • Designed for easy re-configuration through add-on modules such as cathodes and wafer chucks
NEXUS PVD-HR System - Uniformity and repeatability for high-rate alumina deposition
NEXUS PVD-HR System
New
 
 

Features:

  • Improved flexibility and process tuneability of ion-assisted deposition
  • Superior thickness uniformity and wafer-to-wafer repeatability without target poisoning
  • Provides arc-free and pinhole-free films

Benefits:

  • Meets high-rate deposition requirements of thick overcoat applications
  • Highest yield with up to 4 times better uniformity and repeatability than competitors
  • Quickest install time and the ability to cluster multiple technologies on the NEXUS  platform
NEXUS PVDi System - Flexible deposition platform serves wide range of applications
NEXUS PVDi System  
 

Features:

  • Integrated system offers a wide range of applications and is 200mm capable 
  • Advanced process capability with multiple deposition modes
  • NEXUS common hardware and software platform

Benefits:

  • Unsurpassed reliability and uniformity helps boost process yields
  • Higher throughput and uptime for lower cost of ownership
  • Easily and cost-effectively integrates with a broad range of Veeco technologies