Process Equipment : Physical Vapor Deposition

NEXUS PVD-HR System

Uniformity and repeatability for high-rate alumina deposition

Veeco's high-rate alumina NEXUS PVD-HR Physical Vapor Deposition System offers superior thickness uniformity and wafer-to-wafer repeatability without target poisoning. Designed to provide arc-free and pinhole-free films, the NEXUS PVD-HR incorporates "best-in-class" technology on a small footprint for a lower cost of ownership.

Description

NEXUS PVD-HR Physical Vapor Deposition System		More Information

Highest yield with up to 4 times better uniformity and repeatability than competitors Industry-leading throughput of 6 x 8" wafers System is 200mm capable, for greater process flexibility Superior deposition rate with tunable film properties provides lowest cost of ownership World-class NEXUS platform integrates with a broad range of Veeco technologies such as ion beam deposition, ion beam etch, atomic layer deposition and reactive sputtering		Contact Veeco for detailed specifications