NEXUS PVD-HR System 
Uniformity and repeatability for high-rate alumina deposition
Veeco's high-rate alumina NEXUS PVD-HR Physical Vapor Deposition System offers superior thickness uniformity and wafer-to-wafer repeatability without target poisoning. Designed to provide arc-free and pinhole-free films, the NEXUS PVD-HR incorporates "best-in-class" technology on a small footprint for a lower cost of ownership.
NEXUS PVD-HR Physical Vapor Deposition System
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- Highest yield with up to 4 times better uniformity and repeatability than competitors
- Industry-leading throughput of 6 x 8" wafers
- System is 200mm capable, for greater process flexibility
- Superior deposition rate with tunable film properties provides lowest cost of ownership
- World-class NEXUS platform integrates with a broad range of Veeco technologies such as ion beam deposition, ion beam etch, atomic layer deposition and reactive sputtering
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Contact Veeco for detailed specifications
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