Process Equipment : Physical Vapor Deposition

Simplicity, reliability and performance are the guiding principals behind Veeco's benchmark NEXUS PVD-1 single wafer process module.  Supported by a long and successful history, this module can be easily configured to meet specific process and production requirements through the addition of standard accessories including cathodes, wafer chucks, gas manifolds, shutter's and pumping packages.  Module standardization simplifies operator and maintenance training requirements as well as spare part stocking.  Compatible with a wide range of wafer sizes, from 3" to 8" round, the system can be tailored to multiple applications common in the data storage sector, such as oxide and nitride deposition, as well as magnetic materials.  A second equally important application space is the semiconductor, GaAs and packaging markets.  As part of the NEXUS platform family, Veeco's PVD-1 module can be integrated with complementary modules (Ion Beam Deposition, Ion Beam Etch, Multi-Target PVD and Atomic Layer Deposition) which share common hardware and software protocols.