Process Equipment
Ion Sources - Systems
Veeco is the world leader in ion beam technology, offering the most comprehensive ion source product line available. With technologies including: DC, RF, Anode Layer, End-Hall and Cylindrical Magnetron.
Veeco's technology advantage in ion beam grid optics has produced some of the world's most collimated and uniform ion beams for etch and alignment applications. In addition, Veeco has produced highly divergent ion sources for large area ion assisted deposition applications. Please contact one of our product specialists to help you select the best solution for your application.
Veeco’s DC ion beam sources come in either circular or linear geometries and are easy to install, clean and maintain.
Ideal for processes using 100% argon, oxygen or other reactive gases, Veeco’s filamentless RF ion sources deliver reliable, long-term performance with low maintenance.
Veeco’s high power anode layer ion sources are scalable in either circular or linear geometries in excess of three meters and feature high current density operation from high vacuum up to milliTorr pressure ranges.
Using intense magnetic fields and substantial electron currents, Veeco’s low maintenance, gridless ion sources produce a very high current density at lower energies than is practical with gridded sources.
Veeco brings its vast ion beam experience to our Isoflux Cylindrical Magnetrons (ICM). These sputtering sources use cylindrical targets to surround the substrate with coating materials.