Ion Sources
Magnetrons - Systems

Features:

• Sputtering sources use cylindrical targets to surround substrate with coating materials
• Provides high deposition rates and excellent target utilization
• Applications include 3-dimensional shapes, wires, fibers, and decorative coatings

Benefits:

• More efficient design compared to planar magnetrons
• Less downtime and relatively inexpensive targets
• Cost-effective solution for challenge of coating complex shapes