Metrology & Instrumentation
Atomic Force Microscopes
Automated AFM / AFP
Optical Interferometric Profilers
Confocal Microscopes
Stylus Profilers
The Nanoscale World Community
Nanotheater
Veeco Probes
 
Epitaxial Equipment
MBE Components
MBE Sources
MBE Systems
MOCVD Systems
 
Process Equipment
Diamond-like Carbon Deposition
Ion Beam Deposition
Ion Beam Etch Systems
Ion Sources
Physical Vapor Deposition
Chemical Vapor Deposition
Lapping/Dicing Systems
Thermal Deposition Sources
CIGS Coating Systems
 
Solutions for a nanoscale world.™
 

Process Equipment : Ion Sources : Gridless Anode Layer Ion Sources

ALS 650 New product

ALS 650
Excellent for long, uninterrupted production runs

The ALS 650 anode layer source provides current densities and uniformities suitable for pre-cleaning, etching, surface modification, ion beam sputter deposition (IBD) and ion beam assisted deposition (IBAD).

ALS 650 Anode Layer Ion Source
   More Information
 
  • Designed for high volume, low maintenance operation
  • Independent beam energy and current control makes anode layer sources excellent resource for highly automated thin film production
  • Provides both gridless and filamentless operation with all inert and reactive gases
  • Applications include architectural/automotive glass, flat panel displays, web coating, ophthalmic, precision optics, and semiconductor
   Contact Veeco for detailed specifications