Ion Sources
Gridded RF Ion Sources - Systems

Features

• Produces broad, uniform, monoenergetic ion beams
• For both inert and oxidizing environments
• Optional 4-grid design offers very high collimation
• Applications include cleaning, etching, texturing and sputtering or enhanced deposition

Benefits:

• Compact, economical design
• Engineered for long-term usage and low maintenance demands
• Filaments & grids easily accessible for maintenance

Features:

• Water-cooled, for low to moderate power operation
• For both inert and oxidizing environments
• Optional 4-grid design offers very high collimation
• Applications include cleaning, etching, texturing and sputtering or enhanced deposition

Benefits:

• Compact design helps conserve space and keep machine costs down
• Very long maintenance intervals enables long production runs
• Filaments & grids easily accessible for maintenance

Features:

• Excellent source for long, uninterrupted reactive processes like optical coating
• Industry's only filamentless RF Neutralizer
• Optional 4-grid design offers very high collimation
• Low to moderate power operation

Benefits:

• Engineered for long-term usage and low maintenance
• Well-suited to both batch and load-locked production processes
• Flexible power range supports a wide range of process designs and throughput requirements

Features:

• Excellent source for long, uninterrupted reactive processes like optical coating
• Low to moderate power operation
• For both inert and oxidizing environments
• Optional 4-grid design offers very high collimation

Benefits:

• Engineered for long-term usage and low maintenance
• Designed for broad, uniform ion beam deposition and ion assist applications
• Stable and efficient plasma operation allows precise control and high

Features:

• Extremely precise high power beam uniformity
• Provides improved packing densities and increased oxidation rates
• Wide variety of grid sets available
• Multiple interface packages facilitate easy upgrade path for existing IAD systems

Benefits:

• Offers substatial deposition rate increases
• Ensures high thin film quality and stable process operation
• Engineered for long-term usage and low maintenance
• Interface designs facilitate cost-effective upgrade for existing IAD systems

Features:

• Excellent source for uniform, high volume processes
• Well-suited for low maintenance, long production runs
• Optional 4-grid design offers very high collimation

Benefits:

• Engineered for long-term, uninterrupted operation
• Enables higher process productivity, reduces thin film manufacturing costs
• Flexible source for multiple ion beam applications

Features:

• Well-suited for low maintenance, long production runs
• Excellent source for uniform, high volume processes
• Industry's only filamentless RF Neutralizer

Benefits:

• Flexiblity to support multiple ion beam processes (pre-clean, etch,etc.)
• Provides highly reliable operation in long-term, uninterrupted process runs
• Enables higher process productivity, reduces thin film manufacturing costs

Features:

• Designed for long uninterrupted production runs
• Especially suited for optical coatings and thin films involving metal oxides and other dielectric materials
• Features filamentless, inductively coupled design for low maintenance operation

Benefits:

• Supports multiple ion beam processes such as pre-clean, etch and ion beam assisted deposition
• Proven reliability in high volume, automated operating environments
• Enables higher process productivity, reduces thin film manufacturing costs

Key Features:

• Powerful enough for production environments.
• Flexible enough for R&D lab challenges.
• Full automatic controlenhances process automation