Metrology & Instrumentation
Process Equipment
Epitaxial Equipment
Process Equipment : Ion Sources
Gridded RF Ion Sources
Veeco’s filamentless RF ion sources are low maintenance and ideal for processes using 100% argon, oxygen or other reactive gases. They come in either circular or linear geometries. RF sources produce broad, uniform, monoenergetic ion beams in both inert and oxidizing environments. An optional 4-grid design offers very high collimation. In addition, these sources have very long maintenance intervals, making them ideal for both batch and load-locked production processes. Veeco offers the following RF Ion Sources: 3cm RF; 6cm RF; 12cm RF; 16cm RF; 16cm High Power RF; 6 x 22cm RF; 6 x 66cm RF; and 6 x 110cm RF.
3cm Ion Source
The 3cm is ideal for cleaning, etching, texturing and sputtering or enhanced deposition. The filament and grids are easily accessible for effortless maintenance.
The 3cm is ideal for cleaning, etching, texturing and sputtering or enhanced deposition. The filament and grids are easily accessible for effortless maintenance.
6cm Ion Source
The 6cm is ideal for cleaning, etching, texturing and sputtering or enhanced deposition. The filament and grids are easily accessible for effortless maintenance. RF Ion Source Ideal for Deposition, Assisted Deposition, Etch and Chemically Assisted Etch.
The 6cm is ideal for cleaning, etching, texturing and sputtering or enhanced deposition. The filament and grids are easily accessible for effortless maintenance. RF Ion Source Ideal for Deposition, Assisted Deposition, Etch and Chemically Assisted Etch.
12cm RF Ion Source
Ion source for use in long uninterrupted reactive processes such as ion beam assist or ion beam deposition of highly controlled optical coatings.
Ion source for use in long uninterrupted reactive processes such as ion beam assist or ion beam deposition of highly controlled optical coatings.
16cm RF Ion Source
Broad uniform ion beam source for reactive processes such as ion beam assist or ion beam deposition of highly controlled optical coatings.
Broad uniform ion beam source for reactive processes such as ion beam assist or ion beam deposition of highly controlled optical coatings.
16cm RF High Power
High Power ion source, with beam uniformity of < 10% for reactive processes such as ion assisted e-beam (IAD) or sputter deposition processes
High Power ion source, with beam uniformity of < 10% for reactive processes such as ion assisted e-beam (IAD) or sputter deposition processes
6cm x 22cm Ion Source
Ideal Ion Source for Uniform Processing of Medium and Large Scale Substrates. The 6 x 22cm RF linear ion source is designed for in-line systems with pallets of substrates, large substrates or large arrays of small substrates.
Ideal Ion Source for Uniform Processing of Medium and Large Scale Substrates. The 6 x 22cm RF linear ion source is designed for in-line systems with pallets of substrates, large substrates or large arrays of small substrates.
6 x 66cm RF Ion Source
Ion source with low maintenance, filamentless operation on 100% argon, oxygen and other reactive gases for long uninterrupted production runs.
Ion source with low maintenance, filamentless operation on 100% argon, oxygen and other reactive gases for long uninterrupted production runs.
6cm x 110cm Ion Source
Ideal Ion Source for Uniform Processing of Large Scale Substrates. The 6 x 110cm RF linear ion source is a filamentless, inductively coupled design, which allows for low maintenance operation on 100% argon, oxygen, and other reactive gasses.
Ideal Ion Source for Uniform Processing of Large Scale Substrates. The 6 x 110cm RF linear ion source is a filamentless, inductively coupled design, which allows for low maintenance operation on 100% argon, oxygen, and other reactive gasses.
RF2001 Power Supply
Flexible, Automatic Control, Designed to Control Filamentless RF Ion Beam Sources.
Flexible, Automatic Control, Designed to Control Filamentless RF Ion Beam Sources.