Ion Sources
Gridded RF Ion Sources -
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Ion Sources

Features
- Produces broad, uniform, monoenergetic ion beams
- For both inert and oxidizing environments
- Optional 4-grid design offers very high collimation
- Applications include cleaning, etching, texturing and sputtering or enhanced deposition
Benefits:
- Compact, economical design
- Engineered for long-term usage and low maintenance demands
- Filaments & grids easily accessible for maintenance
Features:
- Water-cooled, for low to moderate power operation
- For both inert and oxidizing environments
- Optional 4-grid design offers very high collimation
- Applications include cleaning, etching, texturing and sputtering or enhanced deposition
Benefits:
- Compact design helps conserve space and keep machine costs down
- Very long maintenance intervals enables long production runs
- Filaments & grids easily accessible for maintenance
Features:
- Excellent source for long, uninterrupted reactive processes like optical coating
- Industry's only filamentless RF Neutralizer
- Optional 4-grid design offers very high collimation
- Low to moderate power operation
Benefits:
- Engineered for long-term usage and low maintenance
- Well-suited to both batch and load-locked production processes
- Flexible power range supports a wide range of process designs and throughput requirements
Features:
- Excellent source for long, uninterrupted reactive processes like optical coating
- Low to moderate power operation
- For both inert and oxidizing environments
- Optional 4-grid design offers very high collimation
Benefits:
- Engineered for long-term usage and low maintenance
- Designed for broad, uniform ion beam deposition and ion assist applications
- Stable and efficient plasma operation allows precise control and high
Features:
- Extremely precise high power beam uniformity
- Provides improved packing densities and increased oxidation rates
- Wide variety of grid sets available
- Multiple interface packages facilitate easy upgrade path for existing IAD systems
Benefits:
- Offers substatial deposition rate increases
- Ensures high thin film quality and stable process operation
- Engineered for long-term usage and low maintenance
- Interface designs facilitate cost-effective upgrade for existing IAD systems
Features:
- Excellent source for uniform, high volume processes
- Well-suited for low maintenance, long production runs
- Optional 4-grid design offers very high collimation
Benefits:
- Engineered for long-term, uninterrupted operation
- Enables higher process productivity, reduces thin film manufacturing costs
- Flexible source for multiple ion beam applications
Features:
- Well-suited for low maintenance, long production runs
- Excellent source for uniform, high volume processes
- Industry's only filamentless RF Neutralizer
Benefits:
- Flexiblity to support multiple ion beam processes (pre-clean, etch,etc.)
- Provides highly reliable operation in long-term, uninterrupted process runs
- Enables higher process productivity, reduces thin film manufacturing costs
Features:
- Designed for long uninterrupted production runs
- Especially suited for optical coatings and thin films involving metal oxides and other dielectric materials
- Features filamentless, inductively coupled design for low maintenance operation
Benefits:
- Supports multiple ion beam processes such as pre-clean, etch and ion beam assisted deposition
- Proven reliability in high volume, automated operating environments
- Enables higher process productivity, reduces thin film manufacturing costs
Key Features:
- Powerful enough for production environments.
- Flexible enough for R&D lab challenges.
- Full automatic controlenhances process automation